subsets/box-plot/test/metadata.jsonl

{"file_name":"images/test_atomic-layer-etching_experimental-usecase_47_FIG4_a.jpg","caption":"","id":"test/atomic-layer-etching/experimental-usecase/47/FIG4_a","sample_id":"atomic-layer-etching/experimental-usecase/47/FIG4_a","subset":"box-plot","split":"test","classification":[{"panel_id":"a","label":"box plot"}],"summarization":"[{\"panel_id\":\"a\",\"text\":\"The etch per cycle EPC (in Å) is plotted against oxygen pulse length (in seconds). As the oxygen pulse length increases, there is a corresponding increase in EPC.\"}]","data_extraction":"[{\"panel_id\":\"a\",\"text\":\"| O₂ pulse length (s) | EPC (Å) |\\n|---|---|\\n| 1 | 0.4 |\\n| 2 | 0.8 |\\n| 3 | 1.2 |\\n| 6 | 1.8 |\\n| 10 | 2.0 |\"}]","vqa":"[{\"panel_id\":\"a\",\"items\":[{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"The pulse is considered to saturate when increasing the pulse length no longer affects the EPC of the process.\"},{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Paragraph\",\"answer\":\"The O2 pulse was studied first at 300 °C. The length of the NbCl5 pulse was kept at 4 s and the purge lengths at 1 s. It was found that the O2 pulse does not fully saturate even with 10 s pulse times, but the increase in EPC slows down gradually.\"},{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"No, not O2 pulse.\"},{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Paragraph\",\"answer\":\"In the interest of optimizing the etch rate per time unit, 3 s was chosen as the O2 pulse length for further experiments.\"}]}]","bbox":[{"panel_id":"a","x":8,"y":5,"width":662,"height":566}],"source":"icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/images/FIG4_a.jpg","provenance":{"source_annotation":"icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/images/FIG4_a.json","source_content":"icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/content.json","source_pdf":["icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/Atomic layer etching of molybdenum with O2 and NbCl5.pdf"],"main_category":"atomic-layer-etching","sub_category":"experimental-usecase","paper_id":"47","first_classification_panel_id":"a","first_classification_label":"box plot","caption_source":"not_found"},"width":675,"height":575,"image_format":"jpeg","image_sha256":"9b9b64f5f899d85f8a99d620f551e42929dd18301d98c8a3cce103cb104839c9","metadata_license":"CC BY 4.0","image_license":"source_publisher_rights_reserved","image_reuse_status":"non_commercial_research_use_only","schema_version":"1.0.0"}
{"file_name":"images/test_atomic-layer-etching_experimental-usecase_47_FIG4_b.jpg","caption":"FIG. 4. EPC of molybdenum at  $300^{\\circ}\\mathrm{C}$  (a) as a function of the  $\\mathrm{O}_2$  pulse length when the  $\\mathrm{NbCl}_5$  pulse is kept at 4 s and (b) as a function of the  $\\mathrm{NbCl}_5$  pulse length when the  $\\mathrm{O}_3$  pulse length is kept at 3 s.","id":"test/atomic-layer-etching/experimental-usecase/47/FIG4_b","sample_id":"atomic-layer-etching/experimental-usecase/47/FIG4_b","subset":"box-plot","split":"test","classification":[{"panel_id":"a","label":"box plot"}],"summarization":"[{\"panel_id\":\"a\",\"text\":\"The etch per cycle EPC  is plotted against the pulse length of NbCl₅. The EPC increases slightly with increasing pulse length.\"}]","data_extraction":"[{\"panel_id\":\"a\",\"text\":\"| NbCl₅ Pulse Length (s) | EPC (Å) | Error Range (Å) |\\n|-------------------------|---------|-----------------|\\n| 0.5                     | 0.95    | ±0.15          |\\n| 1.0                     | 1.05    | ±0.15          |\\n| 1.5                     | 1.10    | ±0.15          |\\n| 2.0                     | 1.20    | ±0.15          |\\n| 4.0                     | 1.20    | ±0.15          |\"}]","vqa":"[{\"panel_id\":\"a\",\"items\":[{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"NbCl5 pulse length was then varied while keeping the O2 pulse constant.\"},{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Paragraph\",\"answer\":\"the NbCl5 pulse is saturated already at 2 s, and 80% of the saturated EPC is reached within the first 0.2 s.\"},{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Paragraph\",\"answer\":\"The fast initial etching followed by gradual saturation is thought to be caused by etching of MoO3 first, followed by slower etching of the lower oxides and generation of the NbCl3/MoCl3 layer.\"},{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Paragraph\",\"answer\":\"4 s NbCl5 pulses were used in the following experiments to ensure complete reaction\"}]}]","bbox":[{"panel_id":"a","x":5,"y":6,"width":687,"height":572}],"source":"icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/images/FIG4_b.jpg","provenance":{"source_annotation":"icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/images/FIG4_b.json","source_content":"icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/content.json","source_pdf":["icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/Atomic layer etching of molybdenum with O2 and NbCl5.pdf"],"main_category":"atomic-layer-etching","sub_category":"experimental-usecase","paper_id":"47","first_classification_panel_id":"a","first_classification_label":"box plot","caption_source":"content.json:image_caption"},"width":711,"height":581,"image_format":"jpeg","image_sha256":"6416c51e2720bca621e13fcd2813342d5a3e4450a3135c24a897942de0644f70","metadata_license":"CC BY 4.0","image_license":"source_publisher_rights_reserved","image_reuse_status":"non_commercial_research_use_only","schema_version":"1.0.0"}
{"file_name":"images/test_atomic-layer-etching_experimental-usecase_47_FIG5_a.jpg","caption":"FIG. 6. Thickness of film etched as a function of the number of ALE cycles at  $300^{\\circ}\\mathrm{C}$  using cycles of  $4\\mathrm{sNbCl}_5$  and  $3\\mathrm{sO}_2$  pulses with 1 s purges.","id":"test/atomic-layer-etching/experimental-usecase/47/FIG5_a","sample_id":"atomic-layer-etching/experimental-usecase/47/FIG5_a","subset":"box-plot","split":"test","classification":[{"panel_id":"a","label":"box plot"}],"summarization":"[{\"panel_id\":\"a\",\"text\":\"The scatter plot relates the temperature with EPC (Å) with error bars indicating variability.\"}]","data_extraction":"[{\"panel_id\":\"a\",\"text\":\"| Temperature (°C) | EPC (Å) |\\n|---|---|\\n| 200 | 0 |\\n| 250 | 0.2 |\\n| 300 | 1.2 |\\n| 350 | 2.6 |\\n| 400 | 3.8 |\"}]","vqa":"[{\"panel_id\":\"a\",\"items\":[{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"The EPC was studied as a function of the etching temperature at 200–400 °C using 4 s NbCl5 pulses and 3 s O2 pulses with 1 s purges.\"},{\"question_type\":\"Comparative/Trend\",\"questions\":\"\",\"answer_type\":\"Paragraph\",\"answer\":\"At 200 °C, no etching is observed, but at 250– 400 °C, the EPC is seen to depend almost linearly on the temperature with these pulsing parameters\"},{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Paragraph\",\"answer\":\"The lack of etching at 200 °C may arise from the fact that at this temperature Mo is oxidized to only MoO2 which NbCl5 is not able to etch at this low temperature . While the oxidation of both Mo and MoO2 to MoO3 are thermodynamically favorable at this temperature, there could be a kinetic barrier to the reaction beyond MoO2.\"},{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Yes/No\",\"answer\":\"Yes\"}]}]","bbox":[{"panel_id":"a","x":2,"y":3,"width":662,"height":573}],"source":"icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/images/FIG5_a.jpg","provenance":{"source_annotation":"icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/images/FIG5_a.json","source_content":"icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/content.json","source_pdf":["icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/Atomic layer etching of molybdenum with O2 and NbCl5.pdf"],"main_category":"atomic-layer-etching","sub_category":"experimental-usecase","paper_id":"47","first_classification_panel_id":"a","first_classification_label":"box plot","caption_source":"content.json:image_caption"},"width":669,"height":578,"image_format":"jpeg","image_sha256":"8af229986b3cba06c62af472a3b30854ba19c8f1c633494062f1336c4098d26b","metadata_license":"CC BY 4.0","image_license":"source_publisher_rights_reserved","image_reuse_status":"non_commercial_research_use_only","schema_version":"1.0.0"}
{"file_name":"images/test_atomic-layer-etching_experimental-usecase_47_FIG6.jpg","caption":"","id":"test/atomic-layer-etching/experimental-usecase/47/FIG6","sample_id":"atomic-layer-etching/experimental-usecase/47/FIG6","subset":"box-plot","split":"test","classification":[{"panel_id":"a","label":"box plot"}],"summarization":"[{\"panel_id\":\"a\",\"text\":\"The images plots the number of ALE cycles and the thicknesses indicating a decreasing trend and etching.\"}]","data_extraction":"[{\"panel_id\":\"a\",\"text\":\"| no. cycles | Thickness left (nm) |\\n|---|---|\\n| 0 | 52 |\\n| 200 | 41 |\\n| 400 | 25 |\\n| 600 | 12 |\\n| 800 | 2 |\\n| 1000 | 1 |\"}]","vqa":"[{\"panel_id\":\"a\",\"items\":[{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"~55nm\"},{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Paragraph\",\"answer\":\"Etch depth as a function of the number of ALE cycles shows the etching increases in a linear fashion as the number of cycles and after 800 cycles the film has been completely etched.\"},{\"question_type\":\"Comparative/Trend\",\"questions\":\"\",\"answer_type\":\"Yes/No\",\"answer\":\"Yes\"},{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"Initial thickness = 55nm,\\nThickness after 200 ALE cycles = 41 nm \\nThickness etched away = 55-41 =14 nm\\nEtch rate = 14/200 = 0.07 nm/cycle\"}]}]","bbox":[{"panel_id":"a","x":5,"y":3,"width":665,"height":572}],"source":"icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/images/FIG6.jpg","provenance":{"source_annotation":"icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/images/FIG6.json","source_content":"icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/content.json","source_pdf":["icdar2026-competition-data/test/gold_standard_test_set/atomic-layer-etching/experimental-usecase/47/Atomic layer etching of molybdenum with O2 and NbCl5.pdf"],"main_category":"atomic-layer-etching","sub_category":"experimental-usecase","paper_id":"47","first_classification_panel_id":"a","first_classification_label":"box plot","caption_source":"not_found"},"width":678,"height":578,"image_format":"jpeg","image_sha256":"90d4552731535a8648595ed14e44132e844b258a65a647cda9cd34df6fd1265f","metadata_license":"CC BY 4.0","image_license":"source_publisher_rights_reserved","image_reuse_status":"non_commercial_research_use_only","schema_version":"1.0.0"}