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imagefolder
Languages:
English
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1K - 10K
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Tags:
scientific-images
materials-science
scientific-figures
atomic-layer-deposition
atomic-layer-etching
experimental-usecase
License:
| {"file_name":"images/validation_atomic-layer-etching_experimental-usecase_15_fig_3.jpg","caption":"FIG. 3. Number of ALE publications per year from 1988 to 2014. The first wave of publications occurred in the 1990s. A resurgence of ALE activity is now occurring.","id":"validation/atomic-layer-etching/experimental-usecase/15/fig_3","sample_id":"atomic-layer-etching/experimental-usecase/15/fig_3","subset":"bar-chart","split":"validation","classification":[{"panel_id":"a","label":"bar chart"}],"summarization":"[{\"panel_id\":\"a\",\"text\":\"The bar chart illustrates the number of ALE reports per year from 1988 to 2014, showing a significant increase during the 'Resurgence' period (approximately after 2006).\"}]","data_extraction":"[{\"panel_id\":\"a\",\"text\":\"| Year | Number of ALE Reports Per Year |\\n|---|---|\\n| 1988 | 2 |\\n| 1990 | 4 |\\n| 1992 | 15 |\\n| 1994 | 16 |\\n| 1996 | 8 |\\n| 1998 | 7 |\\n| 2000 | 8 |\\n| 2002 | 8 |\\n| 2004 | 5 |\\n| 2006 | 17 |\\n| 2008 | 22 |\\n| 2010 | 5 |\\n| 2012 | 28 |\\n| 2014 | 55 |\"}]","vqa":"[{\"panel_id\":\"a\",\"items\":[{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"Between 1990 and 1998.\"},{\"question_type\":\"Comparative/Trend\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"The number of ALE reports have been increased from 1988 to 2014, with a slight decrease in 2001.\"},{\"question_type\":\"Structure-Property\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"2014.\"},{\"question_type\":\"Application/Performance\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"Based on the behavior shown in the figure and the additional publications that have been published over the year, it is reasonable to expect an increase in the number of ALE reports after 2014.\"}]}]","bbox":[{"panel_id":"a","x":0,"y":0,"width":645,"height":569}],"source":"icdar2026-competition-data/dev/atomic-layer-etching/experimental-usecase/15/images/fig_3.jpg","provenance":{"source_annotation":"icdar2026-competition-data/dev/atomic-layer-etching/experimental-usecase/15/images/fig_3.json","source_content":"icdar2026-competition-data/dev/atomic-layer-etching/experimental-usecase/15/content.json","source_pdf":["icdar2026-competition-data/dev/atomic-layer-etching/experimental-usecase/15/Overview of atomic layer etching in the semiconductor industry.pdf"],"main_category":"atomic-layer-etching","sub_category":"experimental-usecase","paper_id":"15","first_classification_panel_id":"a","first_classification_label":"bar chart","caption_source":"content.json:img_caption"},"width":648,"height":569,"image_format":"jpeg","image_sha256":"5e2792e29a49b6314f82fdef2bbf0a10850174c5574e35603835696ede8998de","metadata_license":"CC BY 4.0","image_license":"source_publisher_rights_reserved","image_reuse_status":"non_commercial_research_use_only","schema_version":"1.0.0"} | |
| {"file_name":"images/validation_atomic-layer-etching_simulation-usecase_22_fig_3.jpg","caption":"FIG. 3. Number of ALE publications per year from 1988 to 2014. The first wave of publications occurred in the 1990s. A resurgence of ALE activity is now occurring.","id":"validation/atomic-layer-etching/simulation-usecase/22/fig_3","sample_id":"atomic-layer-etching/simulation-usecase/22/fig_3","subset":"bar-chart","split":"validation","classification":[{"panel_id":"a","label":"bar chart"}],"summarization":"[{\"panel_id\":\"a\",\"text\":\"The bar chart illustrates the number of ALE reports per year from 1988 to 2014, showing a significant increase during the 'Resurgence' period (between 2006 and 2014).\"}]","data_extraction":"[{\"panel_id\":\"a\",\"text\":\"| Year | Number of ALE Reports Per Year |\\n|---|---|\\n| 1988 | 2 |\\n| 1990 | 4 |\\n| 1992 | 15 |\\n| 1994 | 16 |\\n| 1996 | 8 |\\n| 1998 | 7 |\\n| 2000 | 8 |\\n| 2002 | 8 |\\n| 2004 | 5 |\\n| 2006 | 17 |\\n| 2008 | 22 |\\n| 2010 | 5 |\\n| 2012 | 28 |\\n| 2014 | 55 |\"}]","vqa":"[{\"panel_id\":\"a\",\"items\":[{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"Between 1990 and 1998.\"},{\"question_type\":\"Comparative/Trend\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"The number of ALE reports have been increased from 1998 to 2014, with a slight decrease in 2001.\"},{\"question_type\":\"Structure-Property\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"2014.\"},{\"question_type\":\"Application/Performance\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"Based on the behavior shown in the figure and the additional publications that have been published over the year, it is reasonable to expect an increase in the number of ALE reports after 2014.\"}]}]","bbox":[{"panel_id":"a","x":2,"y":1,"width":643,"height":564}],"source":"icdar2026-competition-data/dev/atomic-layer-etching/simulation-usecase/22/images/fig_3.jpg","provenance":{"source_annotation":"icdar2026-competition-data/dev/atomic-layer-etching/simulation-usecase/22/images/fig_3.json","source_content":"icdar2026-competition-data/dev/atomic-layer-etching/simulation-usecase/22/content.json","source_pdf":["icdar2026-competition-data/dev/atomic-layer-etching/simulation-usecase/22/Review Paper -- Overview of atomic layer etching in the semiconductor industry.pdf"],"main_category":"atomic-layer-etching","sub_category":"simulation-usecase","paper_id":"22","first_classification_panel_id":"a","first_classification_label":"bar chart","caption_source":"content.json:img_caption"},"width":648,"height":569,"image_format":"jpeg","image_sha256":"5e2792e29a49b6314f82fdef2bbf0a10850174c5574e35603835696ede8998de","metadata_license":"CC BY 4.0","image_license":"source_publisher_rights_reserved","image_reuse_status":"non_commercial_research_use_only","schema_version":"1.0.0"} | |