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materials-science
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atomic-layer-deposition
atomic-layer-etching
experimental-usecase
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| {"file_name":"images/train_atomic-layer-deposition_simulation-usecase_6_figure_6.jpg","caption":"Figure 6. Theoretical studies of ALD categorized based on the theoretical method and (a) thin film material and the ALD aspect under study, i.e., (b) precursors, (c) deposition characterization, and (d) reaction mechanisms.","id":"train/atomic-layer-deposition/simulation-usecase/6/figure_6","sample_id":"atomic-layer-deposition/simulation-usecase/6/figure_6","subset":"pie-chart","split":"train","classification":[{"panel_id":"a","label":"pie chart"},{"panel_id":"b","label":"pie chart"},{"panel_id":"c","label":"pie chart"},{"panel_id":"d","label":"pie chart"}],"summarization":"[{\"panel_id\":\"a\",\"text\":\"The pie chart illustrates the percentage distribution of various materials used in a study.\"},{\"panel_id\":\"b\",\"text\":\"The pie chart shows how different precursors are studied.\"},{\"panel_id\":\"c\",\"text\":\"The pie chart depicts the distribution of different characterization methods employed in the study.\"},{\"panel_id\":\"d\",\"text\":\"The pie chart illustrates the prevalence of different reaction mechanisms studied.\"}]","data_extraction":"[{\"panel_id\":\"a\",\"text\":\"| Material | Percentage |\\n|----------|------------|\\n| Al2O3 | 34% |\\n| HfO2 | 18% |\\n| TiO2 | 12% |\\n| Cu/CuO | 10% |\\n| ZrO2 | 12% |\\n| ZnO | 4% |\\n| Others | 10% |\"},{\"panel_id\":\"b\",\"text\":\"| Precursor | Percentage |\\n|------------|------------|\\n| DFT | 83% |\\n| GCM/CAMD | 17% |\"},{\"panel_id\":\"c\",\"text\":\"| Characterization Method | Percentage |\\n|-------------------------|------------|\\n| DFT | 30% |\\n| Mass balance | 20% |\\n| Monte Carlo | 30% |\\n| CFD | 5% |\\n| ANSYS Fluent | 5% |\\n| LBM | 5% |\\n| GCM | 5% |\"},{\"panel_id\":\"d\",\"text\":\"| Reaction Mechanism | Percentage |\\n|---------------------|------------|\\n| DFT | 92% |\\n| MD | 4% |\\n| Monte Carlo | 4% |\"}]","vqa":"[{\"panel_id\":\"c\",\"items\":[{\"question_type\":\"Application/Performance\",\"questions\":\"\",\"answer_type\":\"Paragraph\",\"answer\":\"The most used characterization methods for depositions are DFT and monte carlo simulations.\"},{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"Reaction mechanisms are usually studied using DFT.\"},{\"question_type\":\"Comparative/Trend\",\"questions\":\"\",\"answer_type\":\"Paragraph\",\"answer\":\"Yes, this is true.\"}]},{\"panel_id\":\"a\",\"items\":[{\"question_type\":\"Process-Oriented\",\"questions\":\"\",\"answer_type\":\"Factoid\",\"answer\":\"Al2O3 is the most researched with 34%.\"}]}]","bbox":[{"panel_id":"a","x":4,"y":8,"width":454,"height":377},{"panel_id":"b","x":546,"y":3,"width":533,"height":390},{"panel_id":"c","x":0,"y":415,"width":556,"height":373},{"panel_id":"d","x":571,"y":406,"width":509,"height":379}],"source":"icdar2026-competition-data/train/atomic-layer-deposition/simulation-usecase/6/images/figure_6.jpg","provenance":{"source_annotation":"icdar2026-competition-data/train/atomic-layer-deposition/simulation-usecase/6/images/figure_6.json","source_content":"icdar2026-competition-data/train/atomic-layer-deposition/simulation-usecase/6/content.json","source_pdf":["icdar2026-competition-data/train/atomic-layer-deposition/simulation-usecase/6/Mina Shahmohammadi et al.pdf"],"main_category":"atomic-layer-deposition","sub_category":"simulation-usecase","paper_id":"6","first_classification_panel_id":"a","first_classification_label":"pie chart","caption_source":"content.json:img_caption"},"width":1084,"height":789,"image_format":"jpeg","image_sha256":"f176235c4bfe189fb2a1fe861a41e83cd5e1b957f8e717bdb8daa3ebaa922c60","metadata_license":"CC BY 4.0","image_license":"source_publisher_rights_reserved","image_reuse_status":"non_commercial_research_use_only","schema_version":"1.0.0"} | |