# Area-Selective Deposition (ASD)

Recorded Tabulus experiment artifacts for the **Area-Selective Deposition** corpus.

## Papers

- `Bent_2025/` — Liu & Bent (2025), *Nanostructure fabrication by area selective deposition: a brief review*. DOI: [10.1039/D4MH01472C](https://doi.org/10.1039/D4MH01472C)
- `Bonvalot_Vallee_2021/` — Bonvalot et al. (2022), *Area selective deposition using alternate deposition and etch super-cycle strategies*. DOI: [10.1039/D1DT03456A](https://doi.org/10.1039/D1DT03456A)
- `Choi_2023/` — Cho, Go & Choi (2023), *Recent Studies on Area Selective Atomic Layer Deposition of Elemental Metals*. DOI: [10.4150/KPMI.2023.30.2.156](https://doi.org/10.4150/KPMI.2023.30.2.156)
- `Mackus_2014/` — Mackus, Bol & Kessels (2014), *The use of atomic layer deposition in advanced nanopatterning*. DOI: [10.1039/C4NR01954G](https://doi.org/10.1039/C4NR01954G)
- `Park_2026/` — Park et al. (2026), *Area-Selective Atomic Layer Deposition for Next-Generation Semiconductor Processing: Mechanisms of Selectivity Breakdown and Process Integration Strategies*. DOI: [10.3390/mi17101152](https://doi.org/10.3390/mi17101152)
- `Parsons_2020/` — Parsons & Clark (2020), *Area-Selective Deposition: Fundamentals, Applications, and Future Outlook*. DOI: [10.1021/acs.chemmater.0c00722](https://doi.org/10.1021/acs.chemmater.0c00722)
- `Tonner-Zech_2025/` — Shearer & Tonner-Zech (2025), *Role of Molecular Orientation: Comparison of Nitrogenous Aromatic Small Molecule Inhibitors for Area-Selective Atomic Layer Deposition*. DOI: [10.1021/acs.chemmater.4c02231](https://doi.org/10.1021/acs.chemmater.4c02231)

Each paper directory follows the same Step 1–7 organization described in the
top-level `README.md`. Adapter-specific subdirectories preserve the actual
execution granularity of the recorded runs.