This repository distributes ONLY a binary pruning mask (which weight
positions are kept vs. zeroed). It contains no weights from the base model.

The mask is a derivative of the base model listed in the model card and is
provided under that base model's license. You must independently obtain the base
model and comply with its license and acceptable-use policy.

Mask-generation code: MIT (https://github.com/Paramathic/patch).
MaskLLM baselines are our own re-implementation; the MaskLLM method is due to
Fang et al. (NVIDIA), NeurIPS 2024.