D26 / README.md
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D26: MVTec-AD-2 -> T-B1 (unified SFT; viewer-friendly row groups)
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---
tags:
- smart-manufacturing
- sft
- industrial
- vision
license: other
pretty_name: D26
extra_gated_fields:
Name: text
Affiliation: text
Intended use: text
extra_gated_prompt: >-
This dataset is released for **research use**. Access is reviewed and granted
**manually** by the maintainers. Please state your name, affiliation, and intended use.
---
# D26
Binary anomaly detection (public test; private GT withheld -> dropped). Category **B**, task **T-B1**, in the unified Smart-Manufacturing SFT schema.
> The repository name is an internal task code. See **Provenance** below for the underlying dataset.
## Records
**3,914** records (test=1084 · train=2528 · validation=302). Pixel masks are embedded as a `mask` image column.
## Unified SFT schema
| field | type | meaning |
|---|---|---|
| `query` | str | the question / instruction (model input) |
| `image` | Image | the input image (bytes embedded) |
| `annot` | str | the answer — for this dataset: the plain-text image-level label `good` or `anomalous` (public MVTec-AD-2 is binary — no fine-grained defect types). Pixel-level localization is a separate, deferred task whose target is the `mask` column — see **Task, mask & split** below |
| `reasoning` | null | no native CoT in these datasets |
| `cate` | "B" | SFT category |
| `task` | "T-xx" | unified task id |
| `metadata` | str (JSON) | split, provenance, `image_path`, `image_sha256` (dedup key) |
| `mask` | Image \| null | *(T-B1/T-B2 only)* the pixel ground-truth mask, bytes embedded |
| `masks` | list[Image] | *(D21 only)* multi-region masks |
## Task, mask & split
**What this is.** MVTec-AD-2 (Heckler-Kram et al., arXiv:2503.21622, 2025) — advanced unsupervised industrial
anomaly detection & localization over 8 scenarios, emphasizing hard cases (transparent / overlapping objects,
dark-field & back-light illumination, extremely small defects). The public data is **binary** at the image
level — **good** vs **anomalous** — with **no fine-grained defect types**.
**Query & answer (this repo's SFT task).** `query` is our own instruction template (the raw dataset ships no
natural-language question). It asks only whether the object is **good** or **anomalous**; `annot` is the
plain-text answer `good` or `anomalous`. **The query does not ask for a pixel mask.**
**Mask (localization ground truth for a separate, deferred task).** Each anomalous image ships a single binary
ground-truth mask (`mask` column; `1` = defect, `0` = background); normal images have `mask`=null. A text-output
model cannot emit a pixel mask directly, so this release keeps the masks as ground truth but does **not** frame
localization as the query task (deferred; masks remain for pixel-level evaluation / segmentation models).
**Lighting conditions.** Each scene is captured under several lighting conditions — the `bad` filename suffixes
`regular` / `overexposed` / `underexposed` / `shift_*` are **lighting variants, not defect types** — so MVTec-AD-2
can test robustness to real-world illumination shifts.
**Split & withheld data.** `train` = normal only; `validation` = normal only; `test` = the **public** test set
(`test_public`: good + anomalous, masks on the anomalous ones). The **private** test sets (`test_private`,
`test_private_mixed`) keep their ground truth on the official evaluation server and are **not** included here
(not fabricated). See **Records** for exact counts.
## Provenance
Underlying dataset: **MVTec-AD-2**. Upstream license: **CC BY-NC-SA 4.0** (this card is `license: other`; respect the upstream terms). Converted read-only from the raw source into the unified schema; conversion script: `D26/convert_d26.py`, published with `publish/push_to_hf.py`, both in [`AI4Manufacturing/forge_model`](https://github.com/AI4Manufacturing/forge_model).
## Overlap / de-duplication (§8)
None notable. Each record carries `metadata.image_sha256` so overlapping images can be kept entirely on one side of a train/eval split.