text stringlengths 0 43 |
|---|
off-substrate O |
part O |
distortion S-CONPRI |
and O |
residual B-PRO |
stress E-PRO |
are O |
predicted S-CONPRI |
. O |
Validation S-CONPRI |
of O |
part O |
distortion S-CONPRI |
predicted O |
by O |
the O |
QTM B-CONPRI |
model E-CONPRI |
against O |
both O |
experiment S-CONPRI |
and O |
data S-CONPRI |
in O |
literature O |
showed O |
a O |
relative B-CONPRI |
error E-CONPRI |
less O |
than O |
20 O |
% O |
. O |
This O |
QTM S-CONPRI |
, O |
together O |
with O |
the O |
TCN S-CONPRI |
, O |
offers O |
a O |
framework S-CONPRI |
for O |
rapid O |
, O |
part-scale O |
simulations S-ENAT |
of O |
Metal S-MATE |
PBF O |
that O |
can O |
be S-MATE |
used O |
to O |
optimize O |
the O |
build S-PARA |
process O |
and O |
parameters S-CONPRI |
. O |
Additive B-MANP |
manufacturing E-MANP |
( O |
AM S-MANP |
) O |
processes S-CONPRI |
are O |
subject O |
to O |
lower O |
stability S-PRO |
compared O |
to O |
their O |
traditional O |
counterparts O |
. O |
The O |
process S-CONPRI |
inconsistency O |
leads O |
to O |
anomalies S-CONPRI |
in O |
the O |
build S-PARA |
, O |
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