ASD/README.md

Area-Selective Deposition (ASD)

Recorded Tabulus experiment artifacts for the Area-Selective Deposition corpus.

Papers

• Bent_2025/ — Liu & Bent (2025), Nanostructure fabrication by area selective deposition: a brief review. DOI: 10.1039/D4MH01472C
• Bonvalot_Vallee_2021/ — Bonvalot et al. (2022), Area selective deposition using alternate deposition and etch super-cycle strategies. DOI: 10.1039/D1DT03456A
• Choi_2023/ — Cho, Go & Choi (2023), Recent Studies on Area Selective Atomic Layer Deposition of Elemental Metals. DOI: 10.4150/KPMI.2023.30.2.156
• Mackus_2014/ — Mackus, Bol & Kessels (2014), The use of atomic layer deposition in advanced nanopatterning. DOI: 10.1039/C4NR01954G
• Park_2026/ — Park et al. (2026), Area-Selective Atomic Layer Deposition for Next-Generation Semiconductor Processing: Mechanisms of Selectivity Breakdown and Process Integration Strategies. DOI: 10.3390/mi17101152
• Parsons_2020/ — Parsons & Clark (2020), Area-Selective Deposition: Fundamentals, Applications, and Future Outlook. DOI: 10.1021/acs.chemmater.0c00722
• Tonner-Zech_2025/ — Shearer & Tonner-Zech (2025), Role of Molecular Orientation: Comparison of Nitrogenous Aromatic Small Molecule Inhibitors for Area-Selective Atomic Layer Deposition. DOI: 10.1021/acs.chemmater.4c02231

Each paper directory follows the same Step 1–7 organization described in the top-level README.md. Adapter-specific subdirectories preserve the actual execution granularity of the recorded runs.