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> Virginia Commonwealth University has in his cleanroom
> a nice Nikon stepper that it is not being used.
>
> He would like to explore the possibily of selling it,
> trading it for an aligner, or ????
>
> If interested, please contact Prof. Atkinson directly.
>
> Regards
>
> Mario A. Portillo Sr.
> High'born Technology USA Inc.
> Semiconductor Equipment Services
> 5970 SW 18th St. Suite 227
> Boca Raton, FL 33433
> 561 504-0244 cell
> 561 470-1975 office
> 561 395-0074 fax
> hbtusainc at yahoo.com
> www.hbtusainc.com
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
---
From Yong.Shi at stevens.edu Mon Jan 7 10:23:11 2008
From: Yong.Shi at stevens.edu (Yong Shi)
Date: Mon, 07 Jan 2008 10:23:11 -0500
Subject: [labnetwork] PECVD/RIE system
In-Reply-To: <200712072149.lB7LnAkK016149@smtp.washington.edu>
References: <200712072149.lB7LnAkK016149@smtp.washington.edu>
Message-ID: <006501c85141$36c9ad50$c860f69b@me.stevenstech.edu>
Could anyone please recommend a new PECVD/RIE system? We are looking for
such a system. Thanks a lot!
Yong Shi, Ph.D
Assistant Professor
E207 Mechanical Engineering Department
Stevens Institute of Technology
Castle Point on the Hudson
Hoboken, NJ 07030
Tel: (201) 216-5594
Fax: (201) 216-8315
From gaevskim at Princeton.EDU Fri Jan 11 16:39:18 2008
From: gaevskim at Princeton.EDU (Mikhail Gaevski)
Date: Fri, 11 Jan 2008 16:39:18 -0500
Subject: [labnetwork] Bosch ICP etcher
Message-ID: <4787E206.9080406@princeton.edu>
We are planning to buy Bosch ICP etcher for deep silicon etching.
It will be great to use the same etcher also for deep SiO2 etching. The
rest of the vendors honestly told us that the machine has to be
dedicated to the Bosch process only. But STS company claims that their
relatively new STS LpX Pro HRM System can be switched between these two
different processes relatively easy and without time consuming
recalibration and cleaning.
Does anyone on LabNet have an experience with switching between the
Bosch process and oxide etching on a similar etching system?
Thank you for your opinions,
Mikhail Gaevski
Mikhail Gaevski, PhD
Interim Director of
the Micro/Nanofabrication Laboratory
J301 E-Quad, PRISM,
Princeton University
Olden Street, Princeton, NJ 08544
Phone: (609) 258 8234
FAX: (609) 258 1954
e-mail: gaevskim at princeton.edu <mailto:gaevskim at princeton.edu>
From philippe.fluckiger at epfl.ch Sat Jan 12 15:42:49 2008
From: philippe.fluckiger at epfl.ch (Philippe Fluckiger)
Date: Sat, 12 Jan 2008 21:42:49 +0100
Subject: [labnetwork] Bosch ICP etcher
In-Reply-To: <4787E206.9080406@princeton.edu>
References: <4787E206.9080406@princeton.edu>
Message-ID: <000c01c8555b$b23dd240$16b976c0$@fluckiger@epfl.ch>
Dear Mikhail,
Deep SiO2 etching and deep silicon etching are running very well together on
our Alcatel AMS 200 etcher.
More info at: http://cmi.epfl.ch/etch/AMS200.htm
Contact person: cyrille.hibert at epfl.ch
With my very best regards,
Philippe
________________________________________________________________________
Dr Philippe Fl?ckiger
Director of Operations
EPFL Center of MicroNanoTechnology
Phone: +41 21 693 6695
Fax: +41 21 693 5770
Email: philippe.fluckiger at epfl.ch
Biography: http://people.epfl.ch/philippe.fluckiger
CMI: http://cmi.epfl.ch/
Faculty: http://sti.epfl.ch/
Campus: http://www.epfl.ch/
Postal address:
BM 1.125 (BM Building)
Station 17
1015 Lausanne
Switzerland
GPS Coordinates: