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Make sure you use the second edition for either book. I prefer
Campbell, it is more focused on the details of processing. Madou has
more of a "general overview' flavor.
Joel Pikarsky
"Scourge of the Cleanroom"
Mike Berman wrote:
> Hello,
>
> I have 2 questions I would like some help with, first which text book
> is best (or very good) to use for a 200 or 300 level Micro/Nano
> Fabrication class? The class would be "about" 2 hours a week in a
> class room and 3 hours in lab, for 16 weeks. The push would be for
> MEMS not transistors.
>
> Other question, do you have a good project (or link) to a project to
> be used for a one week summer class for high school teachers working
> in Micro/Nano? It would need to be completed in about 12 hours of fab
> time. The fab has a normal tool set, for dep, photo and etch, but
> not for transistors (doping is a problem).
>
> Thanks
>
> Michael Berman
> mberman at ece.arizona.edu
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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labnetwork at mtl.mit.edu
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
From hbtusainc at yahoo.com Thu Mar 15 17:13:41 2007
From: hbtusainc at yahoo.com (Mario Portillo)
Date: Thu, 15 Mar 2007 14:13:41 -0700 (PDT)
Subject: [labnetwork] ultractech 603
Message-ID: <20070315211341.91697.qmail@web52301.mail.re2.yahoo.com>
For sale...
Mario A. Portillo Sr.
High'born Technology USA Inc.
Semiconductor Equipment Services
5970 SW 18th St. Suite 227
Boca Raton, FL 33433
561 504-0244 cell
561 470-1975 office
561 395-0074 fax
hbtusainc at yahoo.com
____________________________________________________________________________________
Don't pick lemons.
See all the new 2007 cars at Yahoo! Autos.
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---
From voros at silicon.EECS.Berkeley.EDU Tue Feb 13 14:39:45 2007
From: voros at silicon.EECS.Berkeley.EDU (Katalin Voros)
Date: Tue, 13 Feb 2007 11:39:45 -0800 (PST)
Subject: [labnetwork] reports from UCB
Message-ID: <200702131939.l1DJdj9g025182@silicon2.EECS.Berkeley.EDU>
Dear Colleagues,
If you are interested in what we are doing you may peruse our
2006 Year End Report at http://microlab.berkeley.edu/text/2K6YER/
and our latest CMOS baseline report at
http://www.eecs.berkeley.edu/Pubs/TechRpts/2007/EECS-2007-26.html
Sincerely
Katalin
--------------------------------------------
KATALIN VOROS
Principal Development Engineer
Microlab Operations Manager
Electrical Engineering and Computer Sciences
University of California at Berkeley
406 Cory Hall #1770
Berkeley, CA 94720-1770
phone: (510) 642-2716
fax: (510) 642-2916
voros at eecs.berkeley.edu
http://microlab.berkeley.edu
--------------------------------------------
From gleskova at Princeton.EDU Tue Feb 13 16:59:40 2007
From: gleskova at Princeton.EDU (Helena Gleskova)
Date: Tue, 13 Feb 2007 16:59:40 -0500
Subject: [labnetwork] Dry etching of ITO
Message-ID: <6.2.1.2.0.20070213165336.02627ed8@imap.princeton.edu>
Does anyone have an experience with dry etching of ITO?
According to some publications, CH4/H2 gas mixture is used.
While we have these gases, I am concerned that the etcher
will be coated with indium afterwards. Do you have any
suggestions, literature references, etc.?
Thank you for your help,
Helena
--------------------------------------------------------------------------------------------------------
Helena Gleskova, Ph.D.
Director, PRISM Micro/Nano Fabrication Facility
http://www.prism.princeton.edu/PRISM_cleanroom/fabrication.htm
Princeton University
Princeton Institute for the Science and Technology of Materials (PRISM)
Engineering Quadrangle, Room J301
Olden Street
Princeton, NJ 08544