task stringclasses 3
values | input unknown | output unknown |
|---|---|---|
extract | "Exp SYN-00000: phosphoric acid 8.5wt%, + tetrazole 1.05%, 50C/60s. etch 483.9 nm/min." | {
"record_id": "SYN-00000",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 8.5,
"unit": "wt%"
}
... |
normalize | "tetrazole ; \"mol/L\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00000"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 8.5wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00001: hydrogen peroxide 24.2%w/w, + benzotriazole 1.98%, 30C/60s. etch 50.3 nm/min." | {
"record_id": "SYN-00001",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 24.2,
"unit": "wt%"
}
},
{... |
normalize | "benzotriazole ; \"M\"" | {
"smiles": "c1ccc2[nH]nnc2c1",
"cas": "95-14-7",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00001"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 24.2wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00002: phosphoric acid 18.7wt%, + tetrazole 1.83%, 50C/60s. etch 432.8 nm/min." | {
"record_id": "SYN-00002",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 18.7,
"unit": "wt%"
}
},
... |
normalize | "tetrazole ; \"M\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00002"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 18.7wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00003: acetic acid 24.9wt%, + tetrazole 1.35%, 25C/120s. etch 247.3 nm/min." | {
"record_id": "SYN-00003",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 24.9,
"unit": "wt%"
}
},
{
... |
normalize | "tetrazole ; \"M\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00003"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 24.9wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00004: acetic acid 24.3wt%, + 5-methylbenzotriazole 0.33%, 50C/30s. etch 41.1 nm/min." | {
"record_id": "SYN-00004",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 24.3,
"unit": "wt%"
}
},
{... |
normalize | "5-methylbenzotriazole ; \"mol/L\"" | {
"smiles": "Cc1ccc2[nH]nnc2c1",
"cas": "136-85-6",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00004"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 24.3wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00005: acetic acid 4.6weight percent, + imidazole 0.7%, 30C/120s. etch 274.1 nm/min." | {
"record_id": "SYN-00005",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 4.6,
"unit": "wt%"
}
},
{
... |
normalize | "imidazole ; \"molar\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00005"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 4.6wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00006: hydrogen peroxide 6.5wt%, + imidazole 0.41%, 40C/60s. etch 35.5 nm/min." | {
"record_id": "SYN-00006",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 6.5,
"unit": "wt%"
}
},
... |
normalize | "imidazole ; \"M\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00006"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 6.5wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00007: acetic acid 12.3weight percent, + EDTA 1.43%, 40C/120s. etch 406.0 nm/min." | {
"record_id": "SYN-00007",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 12.3,
"unit": "wt%"
}
},
{
... |
normalize | "EDTA ; \"molar\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00007"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 12.3wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00008: phosphoric acid 20.1wt%, + tetrazole 1.99%, 40C/30s. etch 162.8 nm/min." | {
"record_id": "SYN-00008",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 20.1,
"unit": "wt%"
}
},
... |
normalize | "tetrazole ; \"M\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00008"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 20.1wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00009: hydrogen peroxide 21.5wt%, + imidazole 0.78%, 30C/60s. etch 213.6 nm/min." | {
"record_id": "SYN-00009",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 21.5,
"unit": "wt%"
}
},
... |
normalize | "imidazole ; \"M\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00009"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 21.5wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00010: acetic acid 20.7wt%, + EDTA 0.1%, 30C/120s. etch 415.2 nm/min." | {
"record_id": "SYN-00010",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 20.7,
"unit": "wt%"
}
},
{
... |
normalize | "EDTA ; \"M\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00010"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 20.7wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00011: acetic acid 28.9weight percent, + benzotriazole 0.41%, 25C/60s. etch 106.1 nm/min." | {
"record_id": "SYN-00011",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 28.9,
"unit": "wt%"
}
},
{... |
normalize | "benzotriazole ; \"molar\"" | {
"smiles": "c1ccc2[nH]nnc2c1",
"cas": "95-14-7",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00011"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 28.9wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00012: hydrogen peroxide 7.4weight percent, + imidazole 1.31%, 40C/60s. etch 91.0 nm/min." | {
"record_id": "SYN-00012",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 7.4,
"unit": "wt%"
}
},
... |
normalize | "imidazole ; \"M\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00012"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 7.4wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00013: phosphoric acid 14.6wt%, + imidazole 1.81%, 30C/120s. etch 336.6 nm/min." | {
"record_id": "SYN-00013",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 14.6,
"unit": "wt%"
}
},... |
normalize | "imidazole ; \"mol/L\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00013"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 14.6wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00014: acetic acid 18.3weight percent, + imidazole 0.91%, 30C/30s. etch 236.3 nm/min." | {
"record_id": "SYN-00014",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 18.3,
"unit": "wt%"
}
},
{... |
normalize | "imidazole ; \"molar\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00014"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 18.3wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00015: phosphoric acid 8.3wt%, + tetrazole 1.14%, 25C/60s. etch 371.0 nm/min." | {
"record_id": "SYN-00015",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 8.3,
"unit": "wt%"
}
},
... |
normalize | "tetrazole ; \"mol/L\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00015"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 8.3wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00016: phosphoric acid 20.5%w/w, + EDTA 1.2%, 30C/120s. etch 155.8 nm/min." | {
"record_id": "SYN-00016",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 20.5,
"unit": "wt%"
}
},
... |
normalize | "EDTA ; \"M\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00016"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 20.5wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00017: acetic acid 7.9%w/w, + imidazole 1.29%, 50C/120s. etch 437.8 nm/min." | {
"record_id": "SYN-00017",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 7.9,
"unit": "wt%"
}
},
{
... |
normalize | "imidazole ; \"molar\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00017"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 7.9wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00018: phosphoric acid 13.9wt%, + benzotriazole 0.56%, 30C/60s. etch 264.3 nm/min." | {
"record_id": "SYN-00018",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 13.9,
"unit": "wt%"
}
... |
normalize | "benzotriazole ; \"mol/L\"" | {
"smiles": "c1ccc2[nH]nnc2c1",
"cas": "95-14-7",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00018"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 13.9wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00019: phosphoric acid 2.4wt%, + imidazole 1.65%, 50C/30s. etch 274.7 nm/min." | {
"record_id": "SYN-00019",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 2.4,
"unit": "wt%"
}
},
... |
normalize | "imidazole ; \"M\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00019"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 2.4wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00020: phosphoric acid 1.1weight percent, + tetrazole 0.08%, 25C/120s. etch 264.6 nm/min." | {
"record_id": "SYN-00020",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 1.1,
"unit": "wt%"
}
},
... |
normalize | "tetrazole ; \"mol/L\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00020"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 1.1wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00021: acetic acid 14.8wt%, + 5-methylbenzotriazole 1.85%, 25C/30s. etch 138.1 nm/min." | {
"record_id": "SYN-00021",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 14.8,
"unit": "wt%"
}
},
{... |
normalize | "5-methylbenzotriazole ; \"molar\"" | {
"smiles": "Cc1ccc2[nH]nnc2c1",
"cas": "136-85-6",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00021"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 14.8wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00022: acetic acid 26.3%w/w, + imidazole 0.59%, 25C/30s. etch 21.3 nm/min." | {
"record_id": "SYN-00022",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 26.3,
"unit": "wt%"
}
},
{... |
normalize | "imidazole ; \"M\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00022"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 26.3wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00023: acetic acid 15.3weight percent, + EDTA 1.31%, 50C/120s. etch 218.3 nm/min." | {
"record_id": "SYN-00023",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 15.3,
"unit": "wt%"
}
},
{
... |
normalize | "EDTA ; \"M\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00023"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 15.3wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00024: hydrogen peroxide 10.7%w/w, + 5-methylbenzotriazole 1.59%, 25C/60s. etch 389.9 nm/min." | {
"record_id": "SYN-00024",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 10.7,
"unit": "wt%"
}
},
{
... |
normalize | "5-methylbenzotriazole ; \"mol/L\"" | {
"smiles": "Cc1ccc2[nH]nnc2c1",
"cas": "136-85-6",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00024"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 10.7wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00025: phosphoric acid 4.8weight percent, + tetrazole 0.27%, 30C/30s. etch 154.6 nm/min." | {
"record_id": "SYN-00025",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 4.8,
"unit": "wt%"
}
},
... |
normalize | "tetrazole ; \"mol/L\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00025"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 4.8wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00026: phosphoric acid 17.3weight percent, + benzotriazole 0.99%, 40C/60s. etch 63.0 nm/min." | {
"record_id": "SYN-00026",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 17.3,
"unit": "wt%"
}
... |
normalize | "benzotriazole ; \"molar\"" | {
"smiles": "c1ccc2[nH]nnc2c1",
"cas": "95-14-7",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00026"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 17.3wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00027: acetic acid 19.2wt%, + 5-methylbenzotriazole 0.78%, 25C/30s. etch 404.1 nm/min." | {
"record_id": "SYN-00027",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 19.2,
"unit": "wt%"
}
},
{... |
normalize | "5-methylbenzotriazole ; \"mol/L\"" | {
"smiles": "Cc1ccc2[nH]nnc2c1",
"cas": "136-85-6",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00027"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 19.2wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00028: acetic acid 14.0wt%, + EDTA 1.0%, 30C/60s. etch 42.7 nm/min." | {
"record_id": "SYN-00028",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 14,
"unit": "wt%"
}
},
{
... |
normalize | "EDTA ; \"mol/L\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00028"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 14.0wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00029: hydrogen peroxide 2.9wt%, + imidazole 1.73%, 25C/120s. etch 226.4 nm/min." | {
"record_id": "SYN-00029",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 2.9,
"unit": "wt%"
}
},
... |
normalize | "imidazole ; \"molar\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00029"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 2.9wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00030: hydrogen peroxide 5.2wt%, + 5-methylbenzotriazole 0.44%, 50C/60s. etch 273.6 nm/min." | {
"record_id": "SYN-00030",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 5.2,
"unit": "wt%"
}
},
{
... |
normalize | "5-methylbenzotriazole ; \"molar\"" | {
"smiles": "Cc1ccc2[nH]nnc2c1",
"cas": "136-85-6",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00030"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 5.2wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00031: phosphoric acid 15.4wt%, + tetrazole 1.84%, 40C/60s. etch 499.1 nm/min." | {
"record_id": "SYN-00031",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 15.4,
"unit": "wt%"
}
},... |
normalize | "tetrazole ; \"M\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00031"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 15.4wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00032: phosphoric acid 2.0weight percent, + imidazole 0.34%, 40C/120s. etch 392.3 nm/min." | {
"record_id": "SYN-00032",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 2,
"unit": "wt%"
}
},
... |
normalize | "imidazole ; \"M\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00032"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 2.0wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00033: hydrogen peroxide 2.9%w/w, + EDTA 0.3%, 40C/30s. etch 379.7 nm/min." | {
"record_id": "SYN-00033",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 2.9,
"unit": "wt%"
}
},
... |
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