text stringlengths 1 2.97k |
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jeanne.guo at rice.edu |
713-348-8227 |
> On Apr 13, 2023, at 6:55 PM, Saba Sadeghi <saba.sadeghi at uwaterloo.ca> wrote: |
> |
> Dear Labnetwork community, |
> |
> I am having an issue with magnetron-sputtering of tantalum with DC power. After a few minutes of sputtering Ta glow spots appear on the surface of the target that eventually cause the plasma to distinguish. I have loaded two fresh 0.31?-thick Ta targets, but both times the same problem occurred, and both times it generated enough particles in a short amount of time ( about 2 hours of sputtering, accumulatively) that led to shorting of the source. |
> |
> I suspected that this might be a cooling issue, but there is enough flow rate at the sputtering source,and I use indium thin foil for thermal contact between the cathode and the target (recommended by the company- MeiVac). |
> |
> Have you experienced such a problem? I am wondering if this could be an issue with the sputtering source or could somehow the two Ta targets I loaded have been compromised? |
> |
> Thank you very much. |
> |
> Best regards, |
> Saba Sadeghi |
> IQC, University of Waterloo |
> |
> |
> _______________________________________________ |
> labnetwork mailing list |
> labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu> |
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From Kevin.Hilgers at asu.edu Fri Apr 14 11:09:07 2023 |
From: Kevin.Hilgers at asu.edu (Kevin Hilgers) |
Date: Fri, 14 Apr 2023 15:09:07 +0000 |
Subject: [labnetwork] JEOL JBX-6000 EBL Up for Auction |
Message-ID: <SJ0PR06MB78455CA17AD14F1149A9A724F8999@SJ0PR06MB7845.namprd06.prod.outlook.com> |
Hello, |
Arizona State University is auctioning off a JEOL JBX-6000 Electron Beam Lithography system with no reserve price. The JBX-6000 EBL is currently operational and being sold as-is where-is at ASU's NanoFab. Further details can be found via the link below. |
https://www.govdeals.com/index.cfm?fa=Main.Item&itemid=2431&acctid=7547 |
The tool resides in class 1000 cleanroom and can be viewed by contacting the NanoFab's Director of Operations, Kevin Hilgers Kevin.Hilgers at ASU.edu<mailto:Kevin.Hilgers at ASU.edu> |
Best regards, |
Kevin |
Kevin Hilgers |
Director of Operations |
NanoFab, Office of Knowledge Enterprise Development |
Arizona State University |
551 E. Tyler Mall, ERC153, Mail Code 6206 |
Tempe, AZ 85287-6206 |
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From saba.sadeghi at uwaterloo.ca Fri Apr 14 16:15:25 2023 |
From: saba.sadeghi at uwaterloo.ca (Saba Sadeghi) |
Date: Fri, 14 Apr 2023 20:15:25 +0000 |
Subject: [labnetwork] Sputtering issue |
In-Reply-To: <70A3D258-EC7F-4534-A275-539D7F366AA9@rice.edu> |
References: <YT2PR01MB872648B730031AF09CDEFF34F0989@YT2PR01MB8726.CANPRD01.PROD.OUTLOOK.COM> |
<70A3D258-EC7F-4534-A275-539D7F366AA9@rice.edu> |
Message-ID: <YT2PR01MB8726A7687A0B6CFEA5702013F0999@YT2PR01MB8726.CANPRD01.PROD.OUTLOOK.COM> |
Hi Jing, |
Thanks a lot for getting back to me and the helpful discussion. |
This was a pure Ta sputtering. I could ignite the plasma at 50 W, 30 sccm Ar, 2E-3 mbar pressure but then the glow spots appear after a few minutes which led to the plasma extinguishing! I could reignite the plasma again by ramping down the power and then up to 50W! by the two hours of sputtering, I meant the sputtering collectively lasted two hours until it shorted. |
The sputtering gun housing were clean before the sputtering, but after it looks like particles accumulated on the surface of the target! and eventually ended up in the housing and caused the short (picture attached) |
Thank you. |
Best, |
Saba |
________________________________ |
From: Jing Guo <jeanne.guo at rice.edu> |
Sent: April 14, 2023 10:25 AM |
To: Saba Sadeghi <saba.sadeghi at uwaterloo.ca> |
Cc: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu> |
Subject: Re: [labnetwork] Sputtering issue |
Hi Saba, |
Was the process a pure Ta sputtering or reactive sputtering? For a pure Ta DC power sputtering process, usually it shouldn?t generate that much particles. Ta coating on the sputter gun house/chimney should have a good adhesion. Any accumulated particles on the Ta target surface after ~ 2 hours sputtering? |
If the chimney or clamp ring for the target has been coated too much materials, you need to clean the whole kit and measure the gun to the ground layer by layer once you install a target. Another issue could be that some magnets got demagnetized which cannot provide strong magnetic field on the target surface. |
What was the strike condition, like pressure, power, gun voltage/current? Did you see whether the voltage/current can stabilize once the plasma was generated? |
There are several ways to figure out it is the sputter gun issue or a Ta target issue. Normally targets should be fine. |
Thanks. |
Best, |
Jing |
--------------------------------------- |
Jing Guo Ph.D. |
Research Scientist |
SEA Cleanroom (SST 017) |
Rice University |
Houston, TX |
jeanne.guo at rice.edu |
713-348-8227 |
On Apr 13, 2023, at 6:55 PM, Saba Sadeghi <saba.sadeghi at uwaterloo.ca> wrote: |
Dear Labnetwork community, |
I am having an issue with magnetron-sputtering of tantalum with DC power. After a few minutes of sputtering Ta glow spots appear on the surface of the target that eventually cause the plasma to distinguish. I have loaded two fresh 0.31?-thick Ta targets, but both times the same problem occurred, and both times it generated enough particles in a short amount of time ( about 2 hours of sputtering, accumulatively) that led to shorting of the source. |
I suspected that this might be a cooling issue, but there is enough flow rate at the sputtering source,and I use indium thin foil for thermal contact between the cathode and the target (recommended by the company- MeiVac). |
Have you experienced such a problem? I am wondering if this could be an issue with the sputtering source or could somehow the two Ta targets I loaded have been compromised? |
Thank you very much. |
Best regards, |
Saba Sadeghi |
IQC, University of Waterloo |
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