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To: Joseph Losby <joseph.losby at ucalgary.ca<mailto:joseph.losby at ucalgary.ca>>; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu> |
Subject: Re: [labnetwork] Is your facility ISO certified? |
This email was sent to you by someone outside the University. |
You should only click on links or attachments if you are certain that the email is genuine and the content is safe. |
Joseph, |
ISO certification is primarily for a manufacturing facility. I don't know of any benefit a shared use facility (I'm assuming that's what you have) would gain. |
Becoming ISO certified is extremely expensive and disruptive, you must also allow annual "audits" to your facility which again are very expensive and disruptive. |
Iso Certification, in simple terms is just an accreditation that you do what you document and document what you do. |
I remember confronting the CEO of a company that I used to work for and asking him if it made the facility any better, his answer was a firm "NO". I then inquired as to why we do it and the answer was "Because our competition has it". |
Best of luck, |
Steve Paolini Equipment Dood |
Harvard University |
________________________________ |
From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> on behalf of Joseph Losby <joseph.losby at ucalgary.ca<mailto:joseph.losby at ucalgary.ca>> |
Sent: Wednesday, March 22, 2023 12:47 PM |
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu> <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>> |
Subject: [labnetwork] Is your facility ISO certified? |
Hello. |
Is your cleanroom facility ISO certified? What are your reasons for having or not having ISO certification? Are there any particular changes you have had to make to your facility to adhere to standards? |
The costs appear to be substantial, and we are still deciding whether or not we should go this route. |
Cheers and thanks for your replies, |
Joe |
Joseph Losby, PhD. |
Operations Manager, qLab |
Quantum City, University of Calgary |
The University of Edinburgh is a charitable body, registered in Scotland, with registration number SC005336. Is e buidheann carthannais a th' ann an Oilthigh Dh?n ?ideann, cl?raichte an Alba, ?ireamh cl?raidh SC005336. |
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From sturm at princeton.edu Fri Mar 24 10:48:49 2023 |
From: sturm at princeton.edu (James C. Sturm) |
Date: Fri, 24 Mar 2023 14:48:49 +0000 |
Subject: [labnetwork] Dry Bed Scrubber for silane, etc |
Message-ID: <DM6PR04MB439672E86ED63FDBEB6FFD82BB849@DM6PR04MB4396.namprd04.prod.outlook.com> |
We have a Si/Ge UHV CVD system for which we want to purchase a dedicated dry bed scrubber. |
Total N2 purges ~38 lpm (from several dry pumps, etc) |
Total H2 100 sccm when purging, but normally < 20 sccm |
Silane ~2 sccm, Germane < 0.05 sccm, Diborane and phosphine < 0.01 sccm. |
Running < 10 hours a week on average. |
We are looking into a Callisto dry bed scrubber (by Jupiter). We have no experience with such systems, having used a hot "combustion chamber" with air pumped in for 20+ years. |
Comments/suggestions/other manufacturers/"been there done that" are welcome. |
Thanks, |
Jim Sturm and Zoe Cyue, Princeton University |
******************************************** |
Prof. James C. Sturm |
Chair, Department of Electrical and Computer Engineering |
Stephen R. Forrest Professor in Electrical Engineering |
Princeton University |
B210 E-Quad, Olden St. |
Princeton, NJ 08540 |
609-258-5610, fax: 609-258-1177 |
sturm at princeton.edu<mailto:sturm at princeton.edu> |
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From deolivei at ualberta.ca Fri Mar 24 13:37:04 2023 |
From: deolivei at ualberta.ca (Gustavo de Oliveira Luiz) |
Date: Fri, 24 Mar 2023 11:37:04 -0600 |
Subject: [labnetwork] Strange "sample memory" with LOR 5B |
Message-ID: <CALPuYFzLg-QX5tPGX7qShke=8o75W=xVb_NB0tUYquFskr4FRg@mail.gmail.com> |
Hello everyone, |
While working on a recipe for LOR 5B/AZ 1512 in our automatic development |
system, I encountered some intriguing effects when reusing wafers for my |
tests. This could be a problem for our users when developing their own |
process, so we'd appreciate it if anyone could help us to understand what |
is going on. |
Below is a picture of a sample right before exposure, taken using our |
MLA150. The dark/bright features you see are NOT etched on the wafer (these |
wafers were never etched). The marks are from a previous lithography test. |
They become apparent after coating the sample with LOR 5B and even more |
after adding AZ 1512. And I don't see them when coating only with AZ 1512 |
(I reused wafers for that process development without any issues). |
[image: Si_w_Oxide_LOR5b-AZ1512_AsCoated.png] |
And what is more intriguing is that these features affect |
exposure/development of my test mask. For instance, on a virgin sample I |
can expose and auto-develop with the same recipe (dose and development |
time) I use for the manual process. On a reused sample, the reisst stack |
behaves as if it were underexposed (a dose test made this very obvious). |
Here are the steps during my tests: |
1. Piranha clean |
2. HMDS prime on a YES oven |
3. Spin-coat with LOR 5B/AZ 1512 (marks show up on a reused sample) |
4. Expose using either a mask aligner or DWL |
5. Auto-develop in our Laurell EDC-650 (resist seems underexposed over |
the marks) |
1. AZ Developer 1:1 ? 90 s |
2. Rinse (DI water) and dry (N2+spin) ? 60-120 s |
3. MF-319 ? 5 s |
4. Rinse (DI water) and dry (N2+spin) ? 60-120 s |
6. Strip resist with Remover PG |
7. Repeat all steps for every iteration |
At first I thought that this could actually be some etching of my Si wafers |
by MF-319, even though unlikely given the low TMAH concentration (and I'm |
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