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The Departments of Chemistry and Physics at the University of |
Louisville (UofL) seek applications for a tenure-track faculty position, |
preferably at the assistant professor level. The applicant's research |
program, which should be directed at the interface of Chemistry and |
Physics, must involve projects that will make extensive use of the new |
10,000 sq. ft. UofL Micro/Nano Cleanroom core facility |
(www.louisville.edu/micronano); and she/he should possess a strong |
background in cleanroom and micro/nano-fabrication techniques. The |
position is expected to be tenured in the Chemistry Department with a |
joint appointment in Physics, depending on the applicant?s |
qualifications and interests. Accordingly, the successful candidate |
should have a Ph.D. in Chemistry, Chemical Physics, or a related field, |
as well as relevant postdoctoral experience. In addition to development |
of a recognized, funded research program, the applicant should also |
demonstrate a strong commitment to undergraduate and graduate teaching. |
Applicants are requested to arrange for the transmission of an |
up-to-date curriculum vitae, three letters of recommendation, and a |
statement of research and teaching interests to: Chair, |
Chemistry/Physics Search Committee, Department of Chemistry, University |
of Louisville, Louisville, KY 40292, FAX 502-852-8149. Proof of |
eligibility for U.S. employment will be required prior to employment. |
Screening of applications will begin on October 15, 2007. For more |
information, see www.louisville.edu/a-s/chemistry and |
www.physics.louisville.edu. Women, African-Americans, and other |
minorities are especially encouraged to apply. |
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From jpalmer at Princeton.EDU Fri Oct 26 16:39:53 2007 |
From: jpalmer at Princeton.EDU (Joseph E. Palmer) |
Date: Fri, 26 Oct 2007 16:39:53 -0400 |
Subject: [labnetwork] Aluminum Sputtering |
Message-ID: <47225099.705@princeton.edu> |
Can anyone suggest any papers on sputtering aluminum? I am looking at |
preventing the Al from depositing all over the chamber, as its light |
weight allows it to go much further than other metals. |
Thanks, |
Joe Palmer |
Facilities Manager, |
PRISM Micro/Nano Fabrication Laboratory |
Princeton University |
-- |
"Freedom should never be confused with license, nor tolerance with acceptance." - Unknown |
From pramod.karulkar at uaf.edu Sun Oct 28 16:10:27 2007 |
From: pramod.karulkar at uaf.edu (Pramod C. Karulkar) |
Date: Sun, 28 Oct 2007 12:10:27 -0800 |
Subject: [labnetwork] Aluminum Sputtering |
In-Reply-To: <47225099.705@princeton.edu> |
Message-ID: <200710282010.l9SKAXnM407859@smtp.uaf.edu> |
(1) Sputter as very low pressures. May help little bit. |
(2) Use ion beam deposition. Entirely different technique. |
(3) Modify your system to make it a quasi ion beam deposition system where |
metal atoms are directed or channeled through a series of grids. There was |
a commercial system like this long time ago for filling deep via. Problem |
is you fill the grids to fast and have to clean them too often. You don't |
use all the Aluminum. You cannot get enough throughput for any practical |
use! |
(4) There is a workaround. You place a chimney around your deposition |
path. You can have it made at an air conditioning duct shop. You can use |
coffee cans. Or you can use the large holiday popcorn cans. Once you |
figure out what works, you can make more permanent , fancy chimney of steel |
or aluminum. |
(5) Cheap way to avoid having to clean system is to use aluminum foil |
(liners of suitable material) everywhere you can to protect from build-up. |
Hope it helps. |
Pramod C. Karulkar, Ph. D. |
President's Professor & Director |
Office of Electronic Miniaturization |
University of Alaska Fairbanks |
3330 Industrial Avenue |
Fairbanks, AK 99701 |
Office: 907 455 2008 |
Cell: 907 322 0225 |
Assistant : 907 455 2000 |
FAX 907 455 2019 |
-----Original Message----- |
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] |
On Behalf Of Joseph E. Palmer |
Sent: Friday, October 26, 2007 12:40 PM |
To: labnetwork at mtl.mit.edu |
Subject: [labnetwork] Aluminum Sputtering |
Can anyone suggest any papers on sputtering aluminum? I am looking at |
preventing the Al from depositing all over the chamber, as its light |
weight allows it to go much further than other metals. |
Thanks, |
Joe Palmer |
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