text stringlengths 1 2.97k |
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5. Auto-develop in our Laurell EDC-650 (resist seems underexposed over the marks) |
* AZ Developer 1:1 ? 90 s |
* Rinse (DI water) and dry (N2+spin) ? 60-120 s |
* MF-319 ? 5 s |
* Rinse (DI water) and dry (N2+spin) ? 60-120 s |
6. Strip resist with Remover PG |
7. Repeat all steps for every iteration |
At first I thought that this could actually be some etching of my Si wafers by MF-319, even though unlikely given the low TMAH concentration (and I'm not sure why that would affect exposure/development). But the sample in the image above has 2 ?m thermal oxide, so practically impervious to TMAH. Not to mention that the brightest crossing marks come from testing a recipe where TMAH was not used at all. This must be some strange interaction between LOR 5B and the sample surface, which I'd expect to be practically reset after piranha and HMDS priming. |
My search for more information regarding LOR 5B and it's sensitivity to surface conditions has proven fruitless so far. And requiring a brand new sample for every iteration can get expensive quite quickly. We'd appreciate it if you could point us to some references where this was discussed in any form, or if you know of a method to avoid this from happening. |
I'm sorry for the long email, and thank you in advance for any comments. |
Best regards, |
-- |
Gustavo de Oliveira Luiz, PhD |
Applications/Research Specialist |
nanoFAB, University of Alberta |
+1 (780) 619-1463 |
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From kckeenan at seas.upenn.edu Mon Mar 27 12:16:49 2023 |
From: kckeenan at seas.upenn.edu (Kyle Keenan) |
Date: Mon, 27 Mar 2023 12:16:49 -0400 |
Subject: [labnetwork] dispensers for gowning supplies |
Message-ID: <CAGTqYdEd7kcQc35y+cd44MSf5NXH3rLmhRdHSEz6nkJsTLQHOw@mail.gmail.com> |
Hello, Lab Network Colleagues. |
I have been tasked with changing the layout of the gowning room for our |
cleanroom, which means I will be changing the way we store and dispense |
gowning supplies. Not only do I mean the clean garments themselves, but all |
of the disposable items, too. Because of this, I am curious to know how |
this is being done at other cleanroom facilities. If you are willing to |
describe your setup or, better yet, share some pictures, it would be |
greatly appreciated. I would also be interested to know what you do and |
don't like about your existing setup. |
I look forward to your replies. |
Best, |
-- |
Kyle Keenan |
Senior Manager - Laboratory Operations |
Quattrone Nanofabrication Facility |
University of Pennsylvania |
P: 215-898-7560 |
F: 215-573-4925 |
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From kdhemc at rit.edu Tue Mar 28 17:03:52 2023 |
From: kdhemc at rit.edu (Karl Hirschman) |
Date: Tue, 28 Mar 2023 21:03:52 +0000 |
Subject: [labnetwork] RIT Student Research Questionnaire |
In-Reply-To: <0000000000002f24e605f77093f0@google.com> |
References: <0000000000002f24e605f77093f0@google.com> |
Message-ID: <PH0PR16MB4735E7E2034D10DCE02CB169C3889@PH0PR16MB4735.namprd16.prod.outlook.com> |
Hello Labnetwork, |
I would like to request your participation in a survey that will help out a team of students working on a research study of water filtration. If this is an area that you are familiar with, and your facility usage and requirements, please fill out the questionnaire. Your help is greatly appreciated! |
Karl Hirschman |
Dr. Karl D. Hirschman, Micron Professor |
Associate Department Head |
Electrical and Microelectronic Engineering |
Rochester Institute of Technology |
168 Lomb Memorial Drive |
Rochester, NY 14623-5604 |
PH: 585-475-5130 |
kdhemc at rit.edu<mailto:kdhemc at rit.edu> |
From: okl9859 at g.rit.edu <okl9859 at g.rit.edu> |
Sent: Tuesday, March 21, 2023 6:29 PM |
To: kdhemc at g.rit.edu |
Subject: RIT Student Research Questionnaire |
[Google Forms] |
Click on link: |
RIT Student Research Questionnaire <https://docs.google.com/forms/d/e/1FAIpQLSenesUobWR7L_hVxxHl85jc5tea7ZqLRIYMVLSumPKS5MC0xA/viewform?vc=0&c=0&w=1&flr=0&usp=mail_form_link> |
https://docs.google.com/forms/d/e/1FAIpQLSenesUobWR7L_hVxxHl85jc5tea7ZqLRIYMVLSumPKS5MC0xA/viewform?vc=0&c=0&w=1&flr=0 |
Hello there! This questionnaire was made by two Rochester Institute of Technology students; Orion Lensing & Benjamin Rippel. We are currently studying water filtration within various industries and how water qualify affects these industries. We have been interviewing many different professionals from water municipalities to agriculture and we now want to look into how water quality affects electronic productions. We are hoping to gain enough information to further our understanding of water filtration/water quality issues so that we may further research possibilities to fix theses problems. |
We would greatly appreciate it if you took some time out of your busy days to fill out this questionnaire. It is imperative we collect these responses quickly due to some deadlines (Next Week), please fill these out at the soonest chance you get. Thank you for all your aid and support, we hope you have a wonderful day! |
This form was created inside of Rochester Institute of Technology. |
Report Abuse<https://docs.google.com/forms/u/1/d/e/1FAIpQLSenesUobWR7L_hVxxHl85jc5tea7ZqLRIYMVLSumPKS5MC0xA/reportabuse?source=https://docs.google.com/forms/d/e/1FAIpQLSenesUobWR7L_hVxxHl85jc5tea7ZqLRIYMVLSumPKS5MC0xA/viewform?sid%3D5cbfef384cb70dee%26vc%3D0%26c%3D0%26w%3D1%26flr%3D0%26token%3D88lwBocBAAA.khgxIMBlob3zhucxSAZDtQ.cv6qsUHuKLwPHT1bofJ5Eg> - Terms of Service<http://www.google.com/accounts/TOS> - Additional Terms<http://www.google.com/google-d-s/terms.html> |
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From ana.n.cohen.ctr at army.mil Tue Mar 28 18:40:31 2023 |
From: ana.n.cohen.ctr at army.mil (Cohen, Ana N CTR USARMY DEVCOM ARL (USA)) |
Date: Tue, 28 Mar 2023 22:40:31 +0000 |
Subject: [labnetwork] Strange "sample memory" with LOR 5B |
Message-ID: <BN8P111MB1447A051B118966F6CEA4ED99F889@BN8P111MB1447.NAMP111.PROD.OUTLOOK.COM> |
Michael got me thinking... Gustavo, could you confirm the DI water rinse |
after the piranha looks as you'd expect? I'm not 100% certain the chemistry, |
but since HMDS is more a surface treatment than a residue remaining on the |
wafer I'm curious if it actually could be unaffected. |
I have definitely seen this 'ghosting' after I solvent strip a patterned |
wafer and then need to rinse with DI water. Any water collected on the wafer |
surface would match wherever resist had previously been, presumably due to |
remaining HMDS. I've not seen it impact further patterning before, but I've |
also not used the LOR in my tests and may also have run less tests per |
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