text stringlengths 1 2.97k |
|---|
> and instructive to know where and what type of institution was responding |
> as that often matters, I.e. industry and academia are different, different |
> regions have different needs, etc. You can't always tell the from tne |
> email address or name alone. |
> |
> Thank you, |
> |
> Aimee |
> |
> Aimee Bross Price |
> Manager, Nanofabrication |
> Nanotech West Lab |
> The Ohio State University |
> |
> _______________________________________________ |
> labnetwork mailing list |
> labnetwork at mtl.mit.edu |
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork |
> |
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From Khaled.Mnaymneh at nrc-cnrc.gc.ca Wed Feb 1 20:59:15 2023 |
From: Khaled.Mnaymneh at nrc-cnrc.gc.ca (Mnaymneh, Khaled) |
Date: Thu, 2 Feb 2023 01:59:15 +0000 |
Subject: [labnetwork] Postdoctoral Fellowship, Silicon Nitride Platform |
Message-ID: <eb818f564b2e4c20b825c6c73d93c4d7@DC01ZWH0011.Corp.nrc.gc.ca> |
Hi All, |
Please distribute to interested parties and networks. |
Cheers, |
Khaled. |
Postdoctoral Fellowship, A Canadian-Based Silicon Nitride Platform (nrc-cnrc.gc.ca)<https://recruitment-recrutement.nrc-cnrc.gc.ca/job/Ottawa-Postdoctoral-Fellowship%2C-A-Canadian-Based-Silicon-Nitride-Platform-ON/567307317/> |
This project will establish a silicon-nitride platform for optical devices targeting classical and quantum applications. Silicon nitride is set to be the new "silicon" for the world's next-generation photonic technologies. Because we are in early days of adaption, there is an excellent opportunity to shape Canada's nitride platform in a unique way and to be an international trendsetter. Continuing to build upon current material and device research, the successful applicant will be expected to lead design, fabrication and characterization efforts in silicon nitride photonics and phononics. Specifically, this will entail a Quantum-Optics-Lab-On-A-Chip approach; design, fabricate and characterize chip components that perform and process optical information. Working with our university partner, you will perform a careful study of film-material parameters; more specifically, the refractive index of highly stoichiometric Si3N4, and how it governs the dispersion engineering and nonlinear optical qualities needed to achieve on-chip all-optical performance. |
Education |
PhD in Physics, Electrical Engineering, Engineering Physics or a relevant Engineering field. |
For information on certificates and diplomas issued abroad, please see Degree equivalency |
Experience |
* Hands-on nanofabrication and thin-film experience |
* Knowledge of integrated optics and chip design, designing and constructing experimental apparatus |
* Experience with lasers, non-linear optics, and detectors |
* Experience with fiber optics |
* Experience with cryostats, vacuum cryogenics would be considered as an asset |
Language Requirements |
English, Information on language requirements and self-assessment tests |
Condition of Employment |
Reliability Status |
Who is eligible? |
* Fellowships will be for two years contingent on satisfactory progress achieved during the first year. |
* Candidates should have obtained a PhD (or equivalent) within the past three years (PhD received on or after July 1, 2020) or expect to complete their PhD within 6 months of appointment. |
* Fellows will work in a lab under the direct supervision of an NRC researcher. |
Application Requirements |
In order to be considered for the program please include the following in your application, please note that you will need to attach the required documents as per the list below when submitting your application. Failure to do so will result in your application being excluded from searches. |
* Resume |
* Statement of Interest in the project (maximum one page in length) |
* PhD Transcript - an electronic copy is sufficient, it does not have to be an official version. |
* List of Publications |
When submitting your application you can include the required documents in any attachment field such as ?Second language evaluation results? or ?Other attachments? |
In addition, applicants who best meet the requirements of the position will be asked to provide three letters of recommendation at a later stage of the competition process. |
Relocation |
Relocation assistance will be determined in accordance with the NRC's directives. |
Compensation |
The intent of this hiring action is to staff through the Postdoctoral Fellowships Program at the RCO-2/AsRO level, which is an early-career level position with a salary range of $74,230 to $103,093. |
NOTE: Salary determination will be based on a review of the candidate's expertise, outcomes and impacts of their previous work experience relative to the requirements of the level. As a guide, the current annual PhD recruiting rate is $74,230. |
NRC employees enjoy a wide-range of competitive benefits including comprehensive health and dental plans, pension and insurance plans, vacation and other leave entitlements. |
Notes |
* Fellowships are open to nationals of all countries, although preference will be given to Canadian Citizens and Permanent Residents of Canada. Please include citizenship information in your application. |
* The incumbent must adhere to safe workplace practices at all times. |
* We thank all those who apply, however only those selected for further consideration will be contacted. |
Please direct your questions, with the requisition number (18898) to: |
E-mail: NRC.NRCHiring-EmbaucheCNRC.CNRC at nrc-cnrc.gc.ca |
Telephone: 343-548-5849 |
Closing Date: 27 March 2023 - 23:59 Eastern Time |
-- |
Dr Khaled Mnaymneh, PEng |
Senior Staff Scientist, National Research Council Canada |
Adjunct Research Professor, Carleton University |
This message and any attachments may contain confidential and privileged material classified as "Protected A" and is for the sole use of the intended recipient. Any review, use, distribution or disclosure by (or to) others is strictly prohibited. If you are not the intended recipient (or authorized to receive for the recipient), please contact the sender by reply email and delete all copies of this message. Thank You. |
Ce message et toute pi?ce jointe connexe pourraient contenir de l'information confidentielle ou privil?gi?e d?sign?e ? Prot?g? A ?. Ils s'adressent exclusivement ? leur destinataire. L'examen, l'utilisation, la distribution et la communication de ce message par ou ? d'autres personnes sont strictement interdits. Si ce message ne vous est pas destin? (ou si vous n'avez pas l'autorisation expresse de le recevoir au nom du destinataire), veuillez contacter l'exp?diteur en r?pondant ? ce courriel et d?truire toute copie du message. Merci. |
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From reet at dtu.dk Thu Feb 2 05:35:31 2023 |
From: reet at dtu.dk (Rebecca Bolt Ettlinger) |
Date: Thu, 2 Feb 2023 10:35:31 +0000 |
Subject: [labnetwork] [External] Question about DC sputtering of zinc |
In-Reply-To: <BYAPR05MB6598D812DBBD76BBCF0439FD9DD19@BYAPR05MB6598.namprd05.prod.outlook.com> |
References: <SA2PR11MB4873AB280451150B96DCC1FA88D39@SA2PR11MB4873.namprd11.prod.outlook.com> |
<BYAPR05MB6598D812DBBD76BBCF0439FD9DD19@BYAPR05MB6598.namprd05.prod.outlook.com> |
Message-ID: <4166ef25910444038e5ec4b00007263d@dtu.dk> |
Hi Sandra, |
We have allowed Zn in a thermal evaporator here at DTU Nanolab (a multi-user university facility). We didn't allow it in our sputter systems as we were concerned about the cryo pumps on those systems being overloaded. Zn was not so easy to control in thermal evaporation and we concluded that the optimal solution would be sputtering in a dedicated system with a turbo pump. |
After evaporation of course Zn was all over the chamber so it required thorough cleaning and also several "bakeout" evaporation runs of Al to get rid of Zn in the deposited layers (we usually use the evaporator for Al and Ag and the chamber gets heated most from the Al evaporation). We checked the deposited Al for traces of Zn by XPS before and after allowing Zn in the chamber and eventually got back to a state where the Zn was not detectable by XPS. We have had no user complaints afterwards but are wary of letting future users deposit Zn again because of the work involved to clean it out and check whether it is gone. |
All the best, |
Rebecca |
Process specialist at DTU Nanolab, Technical University of Denmark |
From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Vlahakis, James |
Sent: 1. februar 2023 16:43 |
To: Malhotra, Sandra Guy <sandra.malhotra at tamu.edu>; Fab Network <labnetwork at mtl.mit.edu> |
Subject: Re: [labnetwork] [External] Question about DC sputtering of zinc |
Hi Sandra, a few years ago we allowed Zn deposition in our "dirty" sputter tool without a heated platen. Consider the attached vapor pressure v Temp chart - at the temps seen in our tool the vapor pressure is below the system base pressure. Since that time we've noted no significant changes in base pressure and other users haven't complained about their films being lower quality. |
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