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From lichen at case.edu Wed Aug 5 10:54:25 2009
From: lichen at case.edu (Li Chen)
Date: Wed, 5 Aug 2009 10:54:25 -0400
Subject: [labnetwork] problem with LPCVD SiN deposition
Message-ID: <00fb01ca15dc$a03f6ca0$e0be45e0$@edu>
Hi:
Recently, our silicon nitride LPCVD tube generates very low deposition rate.
Normally, the depo rate for LSN is 18A/min, and 30A/min for stoic. Nitride.
Now, only about 7A/min for both. The temperature gauge, pressure gauge and
MFCs are newly calibrated.
Anything suggestion for the sudden depo rate drop?
Thank you very much.
Li Chen
MicroFabrication Lab
Dept. of Electrical Engineering and Computer Science
Case Western Reserve University
Bingham 342, 10900 Euclid Avenue
Cleveland, OH 44106-7200
Tel: (216) 368-0393
Fax:(216) 368-6888
Email: <mailto:lichen at case.edu> lichen at case.edu
Web: <http://mems.case.edu/> mems.case.edu
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From conrad at Princeton.EDU Mon Jun 1 15:58:41 2009
From: conrad at Princeton.EDU (Conrad Silvestre)
Date: Mon, 1 Jun 2009 15:58:41 -0400
Subject: [labnetwork] Quartz Tube Ground Joint End Caps
Message-ID: <6B9CB57AADA34DC0BE5D7896C00142CF@princeton.edu>
Does anyone know of any difficulties with using ground joint end caps on
quartz tubes that have a side port for venting gases? The tubes will run up
to 1150C. How much is differential thermal expansion a problem resulting in
the end caps getting stuck?
Conrad Silvestre
Department of Electrical Engineering
C402 EQuad, CN-5263
Princeton University
Princeton, New Jersey 08544-5263
Office: 609-258-6236
Lab: 609-258-6234
FAX: 609-258-1840
Business Cell: 609-356-8825
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From bradshaw at utdallas.edu Fri Jun 19 13:30:26 2009
From: bradshaw at utdallas.edu (Keith Bradshaw)
Date: Fri, 19 Jun 2009 12:30:26 -0500
Subject: [labnetwork] Cadmium Telluride sputtering target exchange problems
Message-ID: <DF7634097BA949C18CD710BB50E375CF@campus.ad.utdallas.edu>
We are getting a strong smell from the chamber and instant oxidation and
flaking of product deposited on the chimney of our Sputtering system when
changing the Cad-Tel target.
What is done to avoid this?
Is this smell harmful?
The flakes are very dark and seem to form when we open the system up to
atmosphere. It is load locked so normally it doesn't see air.
Keith Bradshaw
972-883-2099
RL 10
University of Texas at Dallas Clean Room
NSERL building
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From pkarulkar9 at gmail.com Sun Jun 21 16:41:54 2009
From: pkarulkar9 at gmail.com (Pramod Karulkar)
Date: Sun, 21 Jun 2009 12:41:54 -0800
Subject: [labnetwork] Cadmium Telluride sputtering target exchange
problems
In-Reply-To: <DF7634097BA949C18CD710BB50E375CF@campus.ad.utdallas.edu>
References: <DF7634097BA949C18CD710BB50E375CF@campus.ad.utdallas.edu>
Message-ID: <4A3E9B12.9080504@gmail.com>
Explosive oxidation of very pure thin films in a vacuum chamber is
known. Popping sounds can be heard if a chamber used for depositing
titanium or aluminum is suddenly exposed to room air. Flash of light
can also be seen if the chamber is full of dust or peeling matter. Both
can be dangerous. You have to set up protocols for slow venting,
waiting for a long time ( hour or hours) to allow for slow passivation
of unoxidized materials, and then opening the chamber. Vent and pump