task stringclasses 3
values | input unknown | output unknown |
|---|---|---|
extract | "Exp SYN-00200: hydrogen peroxide 19.1%w/w, + EDTA 0.34%, 30C/30s. etch 422.2 nm/min." | {
"record_id": "SYN-00200",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 19.1,
"unit": "wt%"
}
},
{
... |
normalize | "EDTA ; \"M\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00200"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 19.1wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00201: phosphoric acid 21.1weight percent, + tetrazole 1.22%, 30C/120s. etch 401.3 nm/min." | {
"record_id": "SYN-00201",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 21.1,
"unit": "wt%"
}
... |
normalize | "tetrazole ; \"molar\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00201"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 21.1wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00202: hydrogen peroxide 10.1%w/w, + imidazole 0.09%, 30C/30s. etch 302.4 nm/min." | {
"record_id": "SYN-00202",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 10.1,
"unit": "wt%"
}
},
{
... |
normalize | "imidazole ; \"mol/L\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00202"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 10.1wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00203: acetic acid 24.6weight percent, + tetrazole 1.7%, 50C/30s. etch 431.8 nm/min." | {
"record_id": "SYN-00203",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 24.6,
"unit": "wt%"
}
},
{
... |
normalize | "tetrazole ; \"molar\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00203"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 24.6wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00204: acetic acid 10.0%w/w, + EDTA 1.8%, 50C/60s. etch 111.0 nm/min." | {
"record_id": "SYN-00204",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 10,
"unit": "wt%"
}
},
{
... |
normalize | "EDTA ; \"M\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00204"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 10.0wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00205: acetic acid 17.9weight percent, + benzotriazole 0.7%, 25C/120s. etch 118.2 nm/min." | {
"record_id": "SYN-00205",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 17.9,
"unit": "wt%"
}
},
{
... |
normalize | "benzotriazole ; \"M\"" | {
"smiles": "c1ccc2[nH]nnc2c1",
"cas": "95-14-7",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00205"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 17.9wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00206: acetic acid 4.7wt%, + tetrazole 1.79%, 30C/60s. etch 148.4 nm/min." | {
"record_id": "SYN-00206",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 4.7,
"unit": "wt%"
}
},
{
... |
normalize | "tetrazole ; \"M\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00206"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 4.7wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00207: phosphoric acid 5.2wt%, + tetrazole 1.25%, 30C/30s. etch 69.0 nm/min." | {
"record_id": "SYN-00207",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 5.2,
"unit": "wt%"
}
},
... |
normalize | "tetrazole ; \"molar\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00207"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 5.2wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00208: hydrogen peroxide 20.1%w/w, + imidazole 1.37%, 40C/30s. etch 449.3 nm/min." | {
"record_id": "SYN-00208",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 20.1,
"unit": "wt%"
}
},
{... |
normalize | "imidazole ; \"molar\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00208"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 20.1wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00209: hydrogen peroxide 24.9wt%, + benzotriazole 1.49%, 25C/60s. etch 64.5 nm/min." | {
"record_id": "SYN-00209",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 24.9,
"unit": "wt%"
}
},
... |
normalize | "benzotriazole ; \"molar\"" | {
"smiles": "c1ccc2[nH]nnc2c1",
"cas": "95-14-7",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00209"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 24.9wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00210: hydrogen peroxide 20.3%w/w, + tetrazole 0.91%, 40C/120s. etch 354.0 nm/min." | {
"record_id": "SYN-00210",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 20.3,
"unit": "wt%"
}
},
{
... |
normalize | "tetrazole ; \"mol/L\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00210"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 20.3wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00211: hydrogen peroxide 12.4weight percent, + imidazole 0.39%, 25C/120s. etch 454.3 nm/min." | {
"record_id": "SYN-00211",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 12.4,
"unit": "wt%"
}
},
{... |
normalize | "imidazole ; \"M\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00211"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 12.4wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00212: phosphoric acid 16.5weight percent, + imidazole 1.53%, 30C/120s. etch 35.1 nm/min." | {
"record_id": "SYN-00212",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 16.5,
"unit": "wt%"
}
},... |
normalize | "imidazole ; \"mol/L\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00212"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 16.5wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00213: acetic acid 4.7weight percent, + tetrazole 1.43%, 30C/120s. etch 18.4 nm/min." | {
"record_id": "SYN-00213",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 4.7,
"unit": "wt%"
}
},
{
... |
normalize | "tetrazole ; \"M\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00213"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 4.7wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00214: phosphoric acid 29.7wt%, + 5-methylbenzotriazole 0.24%, 50C/30s. etch 253.9 nm/min." | {
"record_id": "SYN-00214",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 29.7,
"unit": "wt%"
}
},
... |
normalize | "5-methylbenzotriazole ; \"M\"" | {
"smiles": "Cc1ccc2[nH]nnc2c1",
"cas": "136-85-6",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00214"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 29.7wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00215: hydrogen peroxide 12.8%w/w, + EDTA 1.78%, 30C/120s. etch 100.2 nm/min." | {
"record_id": "SYN-00215",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 12.8,
"unit": "wt%"
}
},
{
... |
normalize | "EDTA ; \"M\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00215"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 12.8wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00216: acetic acid 17.7%w/w, + 5-methylbenzotriazole 1.3%, 50C/120s. etch 198.1 nm/min." | {
"record_id": "SYN-00216",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 17.7,
"unit": "wt%"
}
},
{
... |
normalize | "5-methylbenzotriazole ; \"molar\"" | {
"smiles": "Cc1ccc2[nH]nnc2c1",
"cas": "136-85-6",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00216"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 17.7wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00217: acetic acid 11.0wt%, + benzotriazole 1.55%, 30C/120s. etch 322.6 nm/min." | {
"record_id": "SYN-00217",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 11,
"unit": "wt%"
}
},
{
... |
normalize | "benzotriazole ; \"M\"" | {
"smiles": "c1ccc2[nH]nnc2c1",
"cas": "95-14-7",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00217"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 11.0wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00218: hydrogen peroxide 14.7%w/w, + 5-methylbenzotriazole 1.23%, 40C/60s. etch 165.2 nm/min." | {
"record_id": "SYN-00218",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 14.7,
"unit": "wt%"
}
},
{
... |
normalize | "5-methylbenzotriazole ; \"M\"" | {
"smiles": "Cc1ccc2[nH]nnc2c1",
"cas": "136-85-6",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00218"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 14.7wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00219: acetic acid 11.7weight percent, + benzotriazole 1.26%, 25C/30s. etch 430.7 nm/min." | {
"record_id": "SYN-00219",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 11.7,
"unit": "wt%"
}
},
{
... |
normalize | "benzotriazole ; \"mol/L\"" | {
"smiles": "c1ccc2[nH]nnc2c1",
"cas": "95-14-7",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00219"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 11.7wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00220: hydrogen peroxide 11.7wt%, + EDTA 1.37%, 25C/120s. etch 161.4 nm/min." | {
"record_id": "SYN-00220",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 11.7,
"unit": "wt%"
}
},
{... |
normalize | "EDTA ; \"M\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00220"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 11.7wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00221: phosphoric acid 13.3%w/w, + EDTA 1.47%, 50C/60s. etch 18.7 nm/min." | {
"record_id": "SYN-00221",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 13.3,
"unit": "wt%"
}
},... |
normalize | "EDTA ; \"M\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00221"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 13.3wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00222: acetic acid 5.5%w/w, + tetrazole 0.34%, 50C/60s. etch 370.8 nm/min." | {
"record_id": "SYN-00222",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 5.5,
"unit": "wt%"
}
},
{
... |
normalize | "tetrazole ; \"mol/L\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00222"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 5.5wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00223: hydrogen peroxide 22.8%w/w, + benzotriazole 1.17%, 40C/120s. etch 463.4 nm/min." | {
"record_id": "SYN-00223",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 22.8,
"unit": "wt%"
}
},
{
... |
normalize | "benzotriazole ; \"molar\"" | {
"smiles": "c1ccc2[nH]nnc2c1",
"cas": "95-14-7",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00223"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 22.8wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00224: acetic acid 24.8%w/w, + benzotriazole 1.49%, 40C/120s. etch 281.7 nm/min." | {
"record_id": "SYN-00224",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 24.8,
"unit": "wt%"
}
},
{
... |
normalize | "benzotriazole ; \"molar\"" | {
"smiles": "c1ccc2[nH]nnc2c1",
"cas": "95-14-7",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00224"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 24.8wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00225: acetic acid 19.9%w/w, + 5-methylbenzotriazole 1.27%, 25C/30s. etch 72.6 nm/min." | {
"record_id": "SYN-00225",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 19.9,
"unit": "wt%"
}
},
{
... |
normalize | "5-methylbenzotriazole ; \"M\"" | {
"smiles": "Cc1ccc2[nH]nnc2c1",
"cas": "136-85-6",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00225"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 19.9wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00226: acetic acid 3.0%w/w, + EDTA 0.59%, 40C/120s. etch 234.4 nm/min." | {
"record_id": "SYN-00226",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 3,
"unit": "wt%"
}
},
{
... |
normalize | "EDTA ; \"M\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00226"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 3.0wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00227: hydrogen peroxide 11.1wt%, + tetrazole 0.55%, 50C/60s. etch 452.9 nm/min." | {
"record_id": "SYN-00227",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 11.1,
"unit": "wt%"
}
},
... |
normalize | "tetrazole ; \"molar\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00227"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 11.1wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00228: acetic acid 26.3%w/w, + 5-methylbenzotriazole 0.47%, 40C/30s. etch 382.8 nm/min." | {
"record_id": "SYN-00228",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 26.3,
"unit": "wt%"
}
},
{... |
normalize | "5-methylbenzotriazole ; \"mol/L\"" | {
"smiles": "Cc1ccc2[nH]nnc2c1",
"cas": "136-85-6",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00228"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 26.3wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00229: acetic acid 16.5weight percent, + EDTA 0.81%, 30C/60s. etch 48.4 nm/min." | {
"record_id": "SYN-00229",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 16.5,
"unit": "wt%"
}
},
{
... |
normalize | "EDTA ; \"mol/L\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00229"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for photoresist; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 16.5wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00230: hydrogen peroxide 14.0weight percent, + imidazole 0.8%, 50C/30s. etch 316.1 nm/min." | {
"record_id": "SYN-00230",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OO",
"cas": "7722-84-1",
"common_name": "hydrogen peroxide"
},
"concentration": {
"value": 14,
"unit": "wt%"
}
},
... |
normalize | "imidazole ; \"molar\"" | {
"smiles": "c1c[nH]cn1",
"cas": "288-32-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00230"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 14.0wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00231: acetic acid 5.6weight percent, + EDTA 0.06%, 25C/60s. etch 354.3 nm/min." | {
"record_id": "SYN-00231",
"project": "copper_etchant",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 5.6,
"unit": "wt%"
}
},
{
... |
normalize | "EDTA ; \"M\"" | {
"smiles": "OC(=O)CN(CC(=O)O)CCN(CC(=O)O)CC(=O)O",
"cas": "60-00-4",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00231"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for copper_etchant; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 5.6wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00232: acetic acid 28.6wt%, + tetrazole 0.39%, 25C/30s. etch 170.1 nm/min." | {
"record_id": "SYN-00232",
"project": "cmp_slurry",
"components": [
{
"role": "main",
"identifier": {
"smiles": "CC(=O)O",
"cas": "64-19-7",
"common_name": "acetic acid"
},
"concentration": {
"value": 28.6,
"unit": "wt%"
}
},
{
... |
normalize | "tetrazole ; \"mol/L\"" | {
"smiles": "c1nnn[nH]1",
"cas": "288-94-8",
"unit": "mol/L"
} |
explain | {
"result": "BO recommendation",
"record": "SYN-00232"
} | "Recommended because the inhibitor concentration sits near the feasible boundary for cmp_slurry; raising it further is predicted to trade etch rate for selectivity. Suggested next: hold main at 28.6wt%, vary inhibitor +/-0.2wt%." |
extract | "Exp SYN-00233: phosphoric acid 21.9weight percent, + imidazole 0.43%, 50C/30s. etch 481.1 nm/min." | {
"record_id": "SYN-00233",
"project": "photoresist",
"components": [
{
"role": "main",
"identifier": {
"smiles": "OP(=O)(O)O",
"cas": "7664-38-2",
"common_name": "phosphoric acid"
},
"concentration": {
"value": 21.9,
"unit": "wt%"
}
},... |
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