text
stringlengths
1
2.97k
Electronic Materials and Sensors Cleanroom (SEMASC) at the U.S. Army
Research Laboratory.
For details, search General Technical Services, LLC for Photolithography
Technician.
Process Technician - Seeking a Microelectronics and Semiconductor
Fabrication Technician to support our work with the U.S. Army Research
Laboratory in Adelphi, MD. The Fabrication Technician will work on-site in
an integrated, results-oriented research and development
Microelectromechanical Systems (MEMS) team environment within the
state-of-the-art Specialty Electronics Materials and Sensors Cleanroom
(SEMASC) Research Facility.
For details, search HII for Microelectronics and Semiconductor Fabrication
Technician.
--
Paul Sunal, Ph.D.
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20230623/5c888529/attachment.html>
From zh25 at uw.edu Fri Jun 23 14:57:32 2023
From: zh25 at uw.edu (Zheyi Han)
Date: Fri, 23 Jun 2023 18:57:32 +0000
Subject: [labnetwork] Grayscale Photoresist with Non-aqueous Development
Message-ID: <SA1PR08MB758228D09DE3699FDB208D16B723A@SA1PR08MB7582.namprd08.prod.outlook.com>
Dear Labnetwork,
Has anyone used any grayscale photoresists compatible with non-aqueous developers? Any suggestions are highly appreciated!
Thank you,
Zheyi
Zheyi Han
Department of Electrical and Computer Engineering
University of Washington
Zh25 at uw.edu<mailto:Zh25 at uw.edu> | Mobile 607-379-8193
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20230623/dd827410/attachment.html>
From d.c.bikash at iitb.ac.in Sat Jun 24 02:19:52 2023
From: d.c.bikash at iitb.ac.in (Bikash Dev Choudhury)
Date: Sat, 24 Jun 2023 11:49:52 +0530
Subject: [labnetwork] Antireflective coating for Litho process
In-Reply-To: <QB1PR01MB3025ACF0DC08539FC0931F5F9F23A@QB1PR01MB3025.CANPRD01.PROD.OUTLOOK.COM>
References: <63deb77fc7c95265920ddf770ff65c60@iitb.ac.in>
<QB1PR01MB3025ACF0DC08539FC0931F5F9F23A@QB1PR01MB3025.CANPRD01.PROD.OUTLOOK.COM>
Message-ID: <5dc03c31bbc81b3048457652de6e5045@iitb.ac.in>
Thanks Howard!
Will check it.
Does it work only for i- line or for h- line as well?
On 2023-06-23 19:58, Howard Northfield wrote:
> I use Brewer Science, XHRiC I-line Anti Reflective Coating.
>
> See:
> https://wiki.nanotech.ucsb.edu/wiki/images/3/33/XHRiC-Anti-Reflective-Coating.pdf
>
> See also:
> H. Northfield, O. Krupin, R. N. Tait, and P. Berini, "Tri-layer contact
> photolithography process for high-resolution lift-off," Microelectron.
> Eng. 241 (2021).
>
> Howard Northfield
> Research Associate
> Advanced Research Complex (ARC) University of Ottawa
>
> -------------------------
>
> From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Bikash
> Dev Choudhury <d.c.bikash at iitb.ac.in>
> Sent: Friday, June 23, 2023 5:26 AM
> To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
> Subject: [labnetwork] Antireflective coating for Litho process
>
> Attention : courriel externe | external email
>
> Dear Labnetwork,
>
> I am looking for antireflective coating for both top and bottom layer
> in photolitho process.
>
> Looking forward for any lead/info.
>
> Thanks in advance!
>
> --
> Best Regards
> Dr. Bikash Dev Choudhury
> Sr. Process Technologist
> CEN, IITBNF
> Electrical Engineering Department
> IIT Bombay, Mumbai-400076
> Mobile No. 7400319871
--
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20230624/8a7c87c7/attachment.html>
From Howard.Northfield at uottawa.ca Sat Jun 24 13:50:43 2023
From: Howard.Northfield at uottawa.ca (Howard Northfield)
Date: Sat, 24 Jun 2023 17:50:43 +0000
Subject: [labnetwork] Antireflective coating for Litho process
In-Reply-To: <5dc03c31bbc81b3048457652de6e5045@iitb.ac.in>
References: <63deb77fc7c95265920ddf770ff65c60@iitb.ac.in>
<QB1PR01MB3025ACF0DC08539FC0931F5F9F23A@QB1PR01MB3025.CANPRD01.PROD.OUTLOOK.COM>
<5dc03c31bbc81b3048457652de6e5045@iitb.ac.in>
Message-ID: <QB1PR01MB3025307CF4701BCB3AAF8B689F20A@QB1PR01MB3025.CANPRD01.PROD.OUTLOOK.COM>