text stringlengths 1 2.97k |
|---|
Electronic Materials and Sensors Cleanroom (SEMASC) at the U.S. Army |
Research Laboratory. |
For details, search General Technical Services, LLC for Photolithography |
Technician. |
Process Technician - Seeking a Microelectronics and Semiconductor |
Fabrication Technician to support our work with the U.S. Army Research |
Laboratory in Adelphi, MD. The Fabrication Technician will work on-site in |
an integrated, results-oriented research and development |
Microelectromechanical Systems (MEMS) team environment within the |
state-of-the-art Specialty Electronics Materials and Sensors Cleanroom |
(SEMASC) Research Facility. |
For details, search HII for Microelectronics and Semiconductor Fabrication |
Technician. |
-- |
Paul Sunal, Ph.D. |
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From zh25 at uw.edu Fri Jun 23 14:57:32 2023 |
From: zh25 at uw.edu (Zheyi Han) |
Date: Fri, 23 Jun 2023 18:57:32 +0000 |
Subject: [labnetwork] Grayscale Photoresist with Non-aqueous Development |
Message-ID: <SA1PR08MB758228D09DE3699FDB208D16B723A@SA1PR08MB7582.namprd08.prod.outlook.com> |
Dear Labnetwork, |
Has anyone used any grayscale photoresists compatible with non-aqueous developers? Any suggestions are highly appreciated! |
Thank you, |
Zheyi |
Zheyi Han |
Department of Electrical and Computer Engineering |
University of Washington |
Zh25 at uw.edu<mailto:Zh25 at uw.edu> | Mobile 607-379-8193 |
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From d.c.bikash at iitb.ac.in Sat Jun 24 02:19:52 2023 |
From: d.c.bikash at iitb.ac.in (Bikash Dev Choudhury) |
Date: Sat, 24 Jun 2023 11:49:52 +0530 |
Subject: [labnetwork] Antireflective coating for Litho process |
In-Reply-To: <QB1PR01MB3025ACF0DC08539FC0931F5F9F23A@QB1PR01MB3025.CANPRD01.PROD.OUTLOOK.COM> |
References: <63deb77fc7c95265920ddf770ff65c60@iitb.ac.in> |
<QB1PR01MB3025ACF0DC08539FC0931F5F9F23A@QB1PR01MB3025.CANPRD01.PROD.OUTLOOK.COM> |
Message-ID: <5dc03c31bbc81b3048457652de6e5045@iitb.ac.in> |
Thanks Howard! |
Will check it. |
Does it work only for i- line or for h- line as well? |
On 2023-06-23 19:58, Howard Northfield wrote: |
> I use Brewer Science, XHRiC I-line Anti Reflective Coating. |
> |
> See: |
> https://wiki.nanotech.ucsb.edu/wiki/images/3/33/XHRiC-Anti-Reflective-Coating.pdf |
> |
> See also: |
> H. Northfield, O. Krupin, R. N. Tait, and P. Berini, "Tri-layer contact |
> photolithography process for high-resolution lift-off," Microelectron. |
> Eng. 241 (2021). |
> |
> Howard Northfield |
> Research Associate |
> Advanced Research Complex (ARC) University of Ottawa |
> |
> ------------------------- |
> |
> From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Bikash |
> Dev Choudhury <d.c.bikash at iitb.ac.in> |
> Sent: Friday, June 23, 2023 5:26 AM |
> To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu> |
> Subject: [labnetwork] Antireflective coating for Litho process |
> |
> Attention : courriel externe | external email |
> |
> Dear Labnetwork, |
> |
> I am looking for antireflective coating for both top and bottom layer |
> in photolitho process. |
> |
> Looking forward for any lead/info. |
> |
> Thanks in advance! |
> |
> -- |
> Best Regards |
> Dr. Bikash Dev Choudhury |
> Sr. Process Technologist |
> CEN, IITBNF |
> Electrical Engineering Department |
> IIT Bombay, Mumbai-400076 |
> Mobile No. 7400319871 |
-- |
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From Howard.Northfield at uottawa.ca Sat Jun 24 13:50:43 2023 |
From: Howard.Northfield at uottawa.ca (Howard Northfield) |
Date: Sat, 24 Jun 2023 17:50:43 +0000 |
Subject: [labnetwork] Antireflective coating for Litho process |
In-Reply-To: <5dc03c31bbc81b3048457652de6e5045@iitb.ac.in> |
References: <63deb77fc7c95265920ddf770ff65c60@iitb.ac.in> |
<QB1PR01MB3025ACF0DC08539FC0931F5F9F23A@QB1PR01MB3025.CANPRD01.PROD.OUTLOOK.COM> |
<5dc03c31bbc81b3048457652de6e5045@iitb.ac.in> |
Message-ID: <QB1PR01MB3025307CF4701BCB3AAF8B689F20A@QB1PR01MB3025.CANPRD01.PROD.OUTLOOK.COM> |
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