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_______________________________________________ |
Michael Yakimov |
Research scientist |
College of Nanoscale Science and Engineering |
SUNY Polytechnic Institute |
253 Fuller rd. |
Albany NY 12203 |
Phone: 518-437-8609 lab |
e-mail: yakimom at sunypoly.edu |
________________________________ |
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Hollingshead, Dave <hollingshead.19 at osu.edu> |
Sent: Thursday, June 22, 2023 1:28:43 PM |
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu> |
Subject: [labnetwork] Heidelberg MLA150 SU-8 Exposure Dose |
Dear Labnetwork, |
We have found that exposure of SU-8 on our MLA150 tool (using the 375nm laser) seems to require very high doses. Even thin ~500nm thick films (using SU-8 2000.5) have required doses on the order of 1200mJ/cm2 to fully expose. This is 15-20x the recommended dosage from both the datasheet and what we estimate is the exposure dose used on our filtered contact aligners. Thicker films follow the same trend, but not necessarily in a linear fashion (5?m films require ~2000mJ/cm2). |
I am sure the bump from 365nm to 375nm plays a role, but the magnitude of the change seems excessive. FWIW, our other negative resists (eg. nLOF2020) seem to expose properly at reasonable doses. |
Has anyone else experienced this? Does anyone have an explanation or any processing suggestions for using SU-8 with an MLA? |
Thanks, |
-Dave |
Dave Hollingshead |
Manager, Research Operations |
The Ohio State University |
Nanotech West Labs |
Suite 100, 1381 Kinnear Rd, Columbus, OH 43212 |
614.292.1355 Office |
hollingshead.19 at osu.edu<mailto:hollingshead.19 at osu.edu> / nanotech.osu.edu<http://nanotech.osu.edu> |
Pronouns: he/him/his |
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From hathaway at cns.fas.harvard.edu Fri Jun 23 11:48:34 2023 |
From: hathaway at cns.fas.harvard.edu (Hathaway, Malcolm R) |
Date: Fri, 23 Jun 2023 15:48:34 +0000 |
Subject: [labnetwork] TMAH alternatives |
In-Reply-To: <YQBPR0101MB5521CEB79A1B6E2CD711CB47C359A@YQBPR0101MB5521.CANPRD01.PROD.OUTLOOK.COM> |
References: <MN2PR07MB6526C0C512E36FF68083D2EBCB5BA@MN2PR07MB6526.namprd07.prod.outlook.com> |
<YQBPR0101MB5521CEB79A1B6E2CD711CB47C359A@YQBPR0101MB5521.CANPRD01.PROD.OUTLOOK.COM> |
Message-ID: <DM6PR07MB65212B24FFAD5101AFFD4C18CB23A@DM6PR07MB6521.namprd07.prod.outlook.com> |
Hello All, |
Thanks for all your responses regarding potential replacements for TMAH. |
It appears that some folks have been making their own investigations along these lines, and others are interested in doing so. Since some of this work is on-going, the idea was suggested that we create an email list where we can coordinate these efforts. This will be called the TMAH Working Group, so that it can encompass a wide membership, including NNCI member institutions as well as others, including perhaps some industry folks as well. |
As we find out more, we'll keep the main Labnetwork apprised of our progress. |
So, if you have an interest in furthering this work, or would like to share your findings or recommendations, email me at hathaway at cns.fas.harvard.edu, and I'll put you on the mailing list. |
The first notable finding is that Sachem Envure 3330 and Transene SE-33 appear to be the same stuff, i.e. Envure is repackaged in smaller lots for smaller companies and labs by Transene. As Graham at Queens pointed out, Huntsman seems to develop novolac photoresists reasonably well, with some variation in develop time. |
As mentioned previously, the active ingredient in Envure/Transene is TEMAH (triethyl methyl ammonium hydroxide), while Huntsman uses (hydroxyethyl) methyl ammonium hydroxide. With regard to safety, we only have, as yet, whatever the manufacturers say. The marketing info suggests one of the Transene products (SE-33) is around 8x less toxic, while the others may be 15x less toxic. Huntsman just says their stuff is "safer". Clearly, a bit more digging in is called for! |
The initial email for the TMAH Group will go out shortly, |
Thanks, |
Mac Hathaway |
Harvard CNS |
________________________________ |
From: Graham Gibson <gibsong at queensu.ca> |
Sent: Saturday, June 17, 2023 2:42 PM |
To: Hathaway, Malcolm R <hathaway at cns.fas.harvard.edu>; Labnetwork Mailing List <labnetwork at mtl.mit.edu> |
Subject: RE: TMAH alternatives |
Hi Mac, |
I have tried Huntsman?s E-Grade THEMAH as well as another of their products, E-Grade CHOLINE OH, as a developer for standard Novolac photoresists, though not for HSQ (yet). I was pretty happy with their performance in general, though THEMAH was a bit slow compared to standard TMAH developer. |
Cheers, |
Graham Gibson |
Operations Manager, NanoFabrication Kingston |
Queen?s University |
945 Princess Street |
Kingston, Ontario, Canada |
K7L 0E9 |
gibsong at queensu.ca<mailto:gibsong at queensu.ca> |
www.nanofabkingston.ca<https://urldefense.proofpoint.com/v2/url?u=http-3A__www.nanofabkingston.ca_&d=DwMFAg&c=WO-RGvefibhHBZq3fL85hQ&r=TEMLD8-VsxCGtcVzmvpT5GFNSczskEKHzW6aYlttmIY&m=OsyPDb0Ur6EvRRta3mwKsTIMksoH8kgvJF4CjMEccxyIPWc8KlY75EEy4r7Mkh_e&s=C1IJR82INSIBlZMD65yCnLorWFHWjaFNg1gJ81DnzVI&e=> |
From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Hathaway, Malcolm R |
Sent: Thursday, June 15, 2023 2:20 PM |
To: Labnetwork Mailing List <labnetwork at mtl.mit.edu> |
Subject: [labnetwork] TMAH alternatives |
Hello Labnetworkers, |
Has anyone tried one of the TMAH substitutes that have become available? |
How do they work? Are your users satisfied with their results? |
For background, TMAH (tetramethylammonium hydroxide) is widely used in commercial resist developers (3%) and for HSQ developing (25%). In its 25% concentration, TMAH is a potent contact neurotoxin, which is fatal roughly 75% of the time, for exposures greater than 7.5% of body area. Nasty stuff. |
Several companies now have safer alternatives available, which we'd like to try out, such as: |
Envure 3330 (Sachem Chemical), |
E-Grade THEMAH SLM ((hydroxyethyl) methylammonium hydroxide, from Huntsman Chemical), and |
Novo-safe SE-33 (ethyl tri-methy ammonium hydroxide from Transene). |
We are particularly interested in using one of these as an HSQ developer, so we can do away with 25% TMAH. |
Any experiences, good or bad, will be most welcome. |
Thanks, |
Mac Hathaway |
Senior Process and Systems Engineer |
Harvard Center for Nanoscale Systems |
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From paul.sunal at gmail.com Fri Jun 23 12:05:00 2023 |
From: paul.sunal at gmail.com (Paul S) |
Date: Fri, 23 Jun 2023 12:05:00 -0400 |
Subject: [labnetwork] Open Positions - 1) Lithography Technician & 2) |
Process Technician |
Message-ID: <CAGX=WeDEChL=3tgwcfu_0pexrFPGGthig_LCPJq-wmcoo8Qd5w@mail.gmail.com> |
Hello! |
The US Army Research Laboratory is currently seeking qualified candidates |
(limited to US citizens) for a staff position of Lithography Technician and |
research position of Process Technician. If interested or know someone |
interested, please use/forward the links below. |
Lithography Technician - This position supports internal and external user |
research, process development, and device fabrication in the Specialty |
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