text stringlengths 1 2.97k |
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>> laser) seems to require very high doses. Even thin ~500nm thick films |
>> (using SU-8 2000.5) have required doses on the order of 1200mJ/cm2 to |
>> fully expose. This is 15-20x the recommended dosage from both the datasheet |
>> and what we estimate is the exposure dose used on our filtered contact |
>> aligners. Thicker films follow the same trend, but not necessarily in a |
>> linear fashion (5?m films require ~2000mJ/cm2). |
>> |
>> |
>> |
>> I am sure the bump from 365nm to 375nm plays a role, but the magnitude of |
>> the change seems excessive. FWIW, our other negative resists (eg. nLOF2020) |
>> seem to expose properly at reasonable doses. |
>> |
>> |
>> |
>> Has anyone else experienced this? Does anyone have an explanation or any |
>> processing suggestions for using SU-8 with an MLA? |
>> |
>> |
>> |
>> Thanks, |
>> |
>> -Dave |
>> |
>> *Dave Hollingshead* |
>> Manager, Research Operations |
>> |
>> *The Ohio State University* |
>> Nanotech West Labs |
>> Suite 100, 1381 Kinnear Rd, Columbus, OH 43212 |
>> <https://www.google.com/maps/search/1381+Kinnear+Rd,+Columbus,+OH+43212+%0D%0A614?entry=gmail&source=g> |
>> 614 |
>> <https://www.google.com/maps/search/1381+Kinnear+Rd,+Columbus,+OH+43212+%0D%0A614?entry=gmail&source=g>.292.1355 |
>> Office |
>> hollingshead.19 at osu.edu / nanotech.osu.edu |
>> |
>> Pronouns: he/him/his |
>> |
>> |
>> _______________________________________________ |
>> labnetwork mailing list |
>> labnetwork at mtl.mit.edu |
>> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork |
>> |
> _______________________________________________ |
> labnetwork mailing list |
> labnetwork at mtl.mit.edu |
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork |
> |
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From Howard.Northfield at uottawa.ca Fri Jun 23 10:28:49 2023 |
From: Howard.Northfield at uottawa.ca (Howard Northfield) |
Date: Fri, 23 Jun 2023 14:28:49 +0000 |
Subject: [labnetwork] Antireflective coating for Litho process |
In-Reply-To: <63deb77fc7c95265920ddf770ff65c60@iitb.ac.in> |
References: <63deb77fc7c95265920ddf770ff65c60@iitb.ac.in> |
Message-ID: <QB1PR01MB3025ACF0DC08539FC0931F5F9F23A@QB1PR01MB3025.CANPRD01.PROD.OUTLOOK.COM> |
I use Brewer Science, XHRiC I-line Anti Reflective Coating. |
See: |
https://wiki.nanotech.ucsb.edu/wiki/images/3/33/XHRiC-Anti-Reflective-Coating.pdf |
See also: |
H. Northfield, O. Krupin, R. N. Tait, and P. Berini, ?Tri-layer contact photolithography process for high-resolution lift-off,? Microelectron. Eng. 241 (2021). |
Howard Northfield |
Research Associate |
Advanced Research Complex (ARC) |
University of Ottawa |
________________________________ |
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Bikash Dev Choudhury <d.c.bikash at iitb.ac.in> |
Sent: Friday, June 23, 2023 5:26 AM |
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu> |
Subject: [labnetwork] Antireflective coating for Litho process |
Attention : courriel externe | external email |
Dear Labnetwork, |
I am looking for antireflective coating for both top and bottom layer in photolitho process. |
Looking forward for any lead/info. |
Thanks in advance! |
-- |
Best Regards |
Dr. Bikash Dev Choudhury |
Sr. Process Technologist |
CEN, IITBNF |
Electrical Engineering Department |
IIT Bombay, Mumbai-400076 |
Mobile No. 7400319871 |
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From yakimom at sunypoly.edu Fri Jun 23 11:15:06 2023 |
From: yakimom at sunypoly.edu (Michael Yakimov) |
Date: Fri, 23 Jun 2023 15:15:06 +0000 |
Subject: [labnetwork] Heidelberg MLA150 SU-8 Exposure Dose |
In-Reply-To: <SA1PR01MB6544488F2AF7FBED45495CE2F322A@SA1PR01MB6544.prod.exchangelabs.com> |
References: <SA1PR01MB6544488F2AF7FBED45495CE2F322A@SA1PR01MB6544.prod.exchangelabs.com> |
Message-ID: <BY3PR05MB826038266C8356C8B89A269ECE23A@BY3PR05MB8260.namprd05.prod.outlook.com> |
375 looks to be in the region where both native absorbtion and exposure bleaching are significant, and absorbtion curve sliope is high. . |
An interesting experiment I see is a measurements of transmitted light intensity during exposure. If you can do that, I suspect that may give a lot of food for though. |
THanks |
mike |
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