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> linear fashion (5?m films require ~2000mJ/cm2).
>
>
>
> I am sure the bump from 365nm to 375nm plays a role, but the magnitude of
> the change seems excessive. FWIW, our other negative resists (eg. nLOF2020)
> seem to expose properly at reasonable doses.
>
>
>
> Has anyone else experienced this? Does anyone have an explanation or any
> processing suggestions for using SU-8 with an MLA?
>
>
>
> Thanks,
>
> -Dave
>
> *Dave Hollingshead*
> Manager, Research Operations
>
> *The Ohio State University*
> Nanotech West Labs
> Suite 100, 1381 Kinnear Rd, Columbus, OH 43212
> <https://www.google.com/maps/search/1381+Kinnear+Rd,+Columbus,+OH+43212+%0D%0A614?entry=gmail&source=g>
> 614
> <https://www.google.com/maps/search/1381+Kinnear+Rd,+Columbus,+OH+43212+%0D%0A614?entry=gmail&source=g>.292.1355
> Office
> hollingshead.19 at osu.edu / nanotech.osu.edu
>
> Pronouns: he/him/his
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From d.c.bikash at iitb.ac.in Fri Jun 23 05:26:48 2023
From: d.c.bikash at iitb.ac.in (Bikash Dev Choudhury)
Date: Fri, 23 Jun 2023 14:56:48 +0530
Subject: [labnetwork] Antireflective coating for Litho process
Message-ID: <63deb77fc7c95265920ddf770ff65c60@iitb.ac.in>
Dear Labnetwork,
I am looking for antireflective coating for both top and bottom layer in
photolitho process.
Looking forward for any lead/info.
Thanks in advance!
--
Best Regards
Dr. Bikash Dev Choudhury
Sr. Process Technologist
CEN, IITBNF
Electrical Engineering Department
IIT Bombay, Mumbai-400076
Mobile No. 7400319871
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From nsk0248 at umd.edu Fri Jun 23 08:41:21 2023
From: nsk0248 at umd.edu (Nam Soo Kim)
Date: Fri, 23 Jun 2023 08:41:21 -0400
Subject: [labnetwork] Heidelberg MLA150 SU-8 Exposure Dose
In-Reply-To: <CANpP3DQdVjsfedgvuY-nUL1sfTgU0oWRArbxL48qehyDSJ70BQ@mail.gmail.com>
References: <SA1PR01MB6544488F2AF7FBED45495CE2F322A@SA1PR01MB6544.prod.exchangelabs.com>
<CANpP3DQdVjsfedgvuY-nUL1sfTgU0oWRArbxL48qehyDSJ70BQ@mail.gmail.com>
Message-ID: <CAEgM5RnvQTezHS3fC2PNEBpV2UbUo-oLk5yjQUN5Errj_D6KRQ@mail.gmail.com>
Hi Dave.
We also have similar behavior with SU-8 on the MLA150, using 1200mJ/cm2.
Using the high aspect ratio mode also increases the required dosage.
Hope this helps.
Nam
On Fri, Jun 23, 2023 at 7:53?AM Hitesh Kamble <hit.kamble at gmail.com> wrote:
> Hello Dave,
> I do not know on which material you are coating and expose but certainly
> it behaves this way because of process conditions and energy absorption
> while exposure (down the line you need to tune parameters and understand UV
> penetration).
>
> Again if it is pre-diluted or diluted with T-thinner, store conditions and
> expiry matters.
>
>
> Regards,
> Hitesh
>
>
>
> On Fri, 23 Jun 2023 at 1:57 AM Hollingshead, Dave <hollingshead.19 at osu.edu>
> wrote:
>
>> Dear Labnetwork,
>>
>>
>>
>> We have found that exposure of SU-8 on our MLA150 tool (using the 375nm